Metal/III-V Schottky barrier height tuning for the design of nonalloyed III-V field-effect transistor source/drain contacts

2010 ◽  
Vol 107 (6) ◽  
pp. 063712 ◽  
Author(s):  
Jenny Hu ◽  
Krishna C. Saraswat ◽  
H.-S. Philip Wong
Keyword(s):  
Schottky Barrier ◽  
Barrier Height ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Schottky Barrier Height ◽  
Effect Transistor

scholarly journals Monolayer MoS2 field effect transistor with low Schottky barrier height with ferromagnetic metal contacts

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Sachin Gupta ◽  
F. Rortais ◽  
R. Ohshima ◽  
Y. Ando ◽  
T. Endo ◽  
...  
Keyword(s):  
Schottky Barrier ◽  
Barrier Height ◽  
Gate Voltage ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Schottky Barrier Height ◽  
Metal Contacts ◽  
Back Gate ◽  
Vapor Deposition Technique ◽  
Effect Transistor

AbstractTwo-dimensional MoS2 has emerged as promising material for nanoelectronics and spintronics due to its exotic properties. However, high contact resistance at metal semiconductor MoS2 interface still remains an open issue. Here, we report electronic properties of field effect transistor devices using monolayer MoS2 channels and permalloy (Py) as ferromagnetic (FM) metal contacts. Monolayer MoS2 channels were directly grown on SiO2/Si substrate via chemical vapor deposition technique. The increase in current with back gate voltage (Vg) shows the tunability of FET characteristics. The Schottky barrier height (SBH) estimated for Py/MoS2 contacts is found to be +28.8 meV (at Vg = 0V), which is the smallest value reported so-far for any direct metal (magnetic or non-magnetic)/monolayer MoS2 contact. With the application of positive gate voltage, SBH shows a reduction, which reveals ohmic behavior of Py/MoS2 contacts. Low SBH with controlled ohmic nature of FM contacts is a primary requirement for MoS2 based spintronics and therefore using directly grown MoS2 channels in the present study can pave a path towards high performance devices for large scale applications.

Investigation of Parameters for Schottky Barrier (SB) Height for Schottky Barrier Based Carbon Nanotube Field Effect Transistor Device

2020 ◽  
Vol 15 (7) ◽  
pp. 783-791
Author(s):  
Anil Kumar Bhardwaj ◽  
Sumeet Gupta ◽  
Balwinder Raj
Keyword(s):  
Dielectric Constant ◽  
Carbon Nanotube ◽  
Schottky Barrier ◽  
Barrier Height ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Schottky Barrier Height ◽  
Oxide Thickness ◽  
Proper Choice ◽  
Effect Transistor

The design and development of Schottky Barrier Carbon Nanotube Field Effect Transistor (SB CNTFET) is still in the primitive research phase for its utilization in digital design. There is an immediate requirement for the analysis of parametric relations with structural factors to benefit the researchers working in this field. This work helps in the improvement of SB based CNTFET devices to be used in the development of various circuit applications. In this work, investigation of Schottky Barrier height on the performance of SB CNTFET for various geometrical and physical design parameters at the device level has been reported. The analysis of various device parameters of carbon nanotube, i. e., chirality, diameter, band gap, oxide thickness and dielectric constant has been carried out viz. subthreshold conduction, and ION/IOFF ratio. The paper also reports the effect of high dielectric constant material in SB CNTFET with oxide thickness along with Schottky Barrier Height Variation. The performance of SB CNTFET with variation in Schottky Barrier height and temperature variation is also reported. The results obtained indicate that performance of SB based CNTFET can be modified by the proper choice of chirality, dielectrics, oxide thickness and operating temperature. The SB parameter can be optimized by proper choice of metal contact in case of CNTFET.

scholarly journals Schottky Barrier Height and Image Force Lowering in Monolayer MoS2 Field Effect Transistors

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2346
Author(s):  
Yonatan Vaknin ◽  
Ronen Dagan ◽  
Yossi Rosenwaks
Keyword(s):  
Schottky Barrier ◽  
Barrier Height ◽  
Field Effect ◽  
Schottky Barrier Height ◽  
Field Effect Transistors ◽  
Single Layer ◽  
Image Force ◽  
Transition Metal Dichalcogenide ◽  
Metal Interface ◽  
Effect Transistor

Understanding the nature of the barrier height in a two-dimensional semiconductor/metal interface is an important step for embedding layered materials in future electronic devices. We present direct measurement of the Schottky barrier height and its lowering in the transition metal dichalcogenide (TMD)/metal interface of a field effect transistor. It is found that the barrier height at the gold/ single-layer molybdenum disulfide (MoS2) interfaces decreases with increasing drain voltage, and this lowering reaches 0.5–1 V We also show that increase of the gate voltage induces additional barrier lowering.

Simultaneous achievement of superior response and full recovery of titanium dioxide/graphene hybrid FET sensors for NH3 through p- to n-mode switch

2020 ◽  
Vol 22 (29) ◽  
pp. 16701-16711 ◽  
Author(s):  
Attia Falak ◽  
Yi Tian ◽  
Lanqin Yan ◽  
Xianfeng Zhang ◽  
Lihua Xu ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Schottky Barrier ◽  
Field Effect ◽  
Room Temperature ◽  
Field Effect Transistor ◽  
Schottky Barrier Height ◽  
Mode Switch ◽  
Graphene Field Effect Transistor ◽  
Effect Transistor ◽  
Sensing Performance

Ultrathin TiO2/graphene field effect transistor sensors with 100% titanium coverage (D100) favor the room temperature NH3 sensing performance at lower Schottky barrier height via switch in the sensing mode from p to n.

scholarly journals AlGaN/GaN field effect transistor with two lateral Schottky barrier gates towards resonant detection in sub-mm range

2019 ◽  
Vol 34 (2) ◽  
pp. 024002 ◽  
Author(s):  
P Sai ◽  
D B But ◽  
I Yahniuk ◽  
M Grabowski ◽  
M Sakowicz ◽  
...  
Keyword(s):  
Schottky Barrier ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Effect Transistor

Lowering the Schottky Barrier Height by Graphene/Ag Electrodes for High-Mobility MoS2 Field-Effect Transistors

2018 ◽  
Vol 31 (2) ◽  
pp. 1804422 ◽  
Author(s):  
Sang-Soo Chee ◽  
Dongpyo Seo ◽  
Hanggyu Kim ◽  
Hanbyeol Jang ◽  
Seungmin Lee ◽  
...  
Keyword(s):  
Schottky Barrier ◽  
Barrier Height ◽  
Field Effect ◽  
Schottky Barrier Height ◽  
Field Effect Transistors ◽  
High Mobility ◽  
Ag Electrodes
Sign in / Sign up

Export Citation Format

Share Document