Redistribution of implanted phosphorus after platinum silicide formation and the characteristics of Schottky barrier diodes
Effects of processing conditions on the characteristics of platinum silicide Schottky barrier diodes
1988 ◽
Vol 31
(5)
◽
pp. 843-849
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Keyword(s):
Keyword(s):
1991 ◽
Vol 138
(2)
◽
pp. 616-619
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1976 ◽
Vol 9
(6)
◽
pp. 965-972
◽
2016 ◽
Vol 136
(4)
◽
pp. 479-483