Low-voltage solution-processed n-channel organic field-effect transistors with high-k HfO2 gate dielectrics grown by atomic layer deposition

2009 ◽  
Vol 95 (22) ◽  
pp. 223303 ◽  
Author(s):  
Shree Prakash Tiwari ◽  
Xiao-Hong Zhang ◽  
William J. Potscavage ◽  
Bernard Kippelen
Keyword(s):  
Atomic Layer Deposition ◽  
Field Effect ◽  
Low Voltage ◽  
Gate Dielectrics ◽  
Field Effect Transistors ◽  
Atomic Layer ◽  
Organic Field Effect Transistors ◽  
Solution Processed ◽  
Layer Deposition ◽  
High K

scholarly journals Organic Field-Effect Transistors with a Bilayer Gate Dielectric Comprising an Oxide Nanolaminate Grown by Atomic Layer Deposition

2016 ◽  
Vol 8 (44) ◽  
pp. 29872-29876 ◽  
Author(s):  
Cheng-Yin Wang ◽  
Canek Fuentes-Hernandez ◽  
Minseong Yun ◽  
Ankit Singh ◽  
Amir Dindar ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Field Effect ◽  
Gate Dielectric ◽  
Field Effect Transistors ◽  
Atomic Layer ◽  
Organic Field Effect Transistors ◽  
Layer Deposition

scholarly journals Thin-film passivation by atomic layer deposition for organic field-effect transistors

2008 ◽  
Vol 93 (16) ◽  
pp. 163304 ◽  
Author(s):  
Hayoung Jeon ◽  
Kwonwoo Shin ◽  
Chanwoo Yang ◽  
Chan Eon Park ◽  
Sang-Hee Ko Park
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Atomic Layer ◽  
Organic Field Effect Transistors ◽  
Layer Deposition

High-performance pentacene field-effect transistors using Al2O3 gate dielectrics prepared by atomic layer deposition (ALD)

2007 ◽  
Vol 8 (6) ◽  
pp. 718-726 ◽  
Author(s):  
Xiao-Hong Zhang ◽  
Benoit Domercq ◽  
Xudong Wang ◽  
Seunghyup Yoo ◽  
Takeshi Kondo ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Field Effect ◽  
High Performance ◽  
Gate Dielectrics ◽  
Field Effect Transistors ◽  
Atomic Layer ◽  
Layer Deposition
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