The initial oxidation of Al–Mg alloys: Depth-resolved quantitative analysis by angle-resolved x-ray photoelectron spectroscopy and real-time in situ ellipsometry

2009 ◽  
Vol 106 (11) ◽  
pp. 114913 ◽  
Author(s):  
E. Panda ◽  
L. P. H. Jeurgens ◽  
E. J. Mittemeijer
Keyword(s):  
Quantitative Analysis ◽  
Real Time ◽  
Photoelectron Spectroscopy ◽  
Mg Alloys ◽  
Initial Oxidation ◽  
X Ray ◽  
Al Mg Alloys

X-Ray Photoelectron Spectroscopic Study of the Surface Reaction of Uranium–Niobium Alloy with O2

2003 ◽  
Vol 10 (02n03) ◽  
pp. 381-386 ◽  
Author(s):  
Xiaoguo Fu ◽  
Kezhao Liu ◽  
Xiaolin Wang ◽  
Zhengping Zhao ◽  
Yong Yu
Keyword(s):  
Oxide Film ◽  
Photoelectron Spectroscopy ◽  
Surface Reaction ◽  
Film Formation ◽  
Pure Metal ◽  
Niobium Alloy ◽  
Initial Oxidation ◽  
In Situ Oxidation ◽  
X Ray

The initial oxidation of uranium–niobium alloy in oxygen atmosphere at 298 K has been studied by X-ray photoelectron spectroscopy (XPS). For comparison, the adsorption of oxygen on pure metal niobium and uranium has also been studied. The changes of U4f, Nb3d and O1s spectra during in situ oxidation indicate that the adsorption of oxygen on uranium–niobium alloy surfaces first leads to the formation of UO2 and NbO; then NbO2 and Nb2O5 are detected with increasing exposures of oxygen. The segregations of U and Nb to the uranium–niobium alloy surfaces are observed at different oxidation stages. The oxide film formation of uranium–niobium alloy is faster than that of pure uranium at initial oxidation stages.

Initial oxidation of GaAs(100) under near-realistic environments revealed by in situ AP-XPS

2020 ◽  
Vol 56 (94) ◽  
pp. 14905-14908
Author(s):  
Ryo Toyoshima ◽  
Shunya Murakami ◽  
Shinsuke Eguchi ◽  
Kenta Amemiya ◽  
Kazuhiko Mase ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Oxide Interface ◽  
Initial Oxidation ◽  
X Ray

In situ X-ray photoelectron spectroscopy measurements under O2 ambient reveal that the initial oxidation of the GaAs(100) surface proceeds with a quasi-barrier-less process, concomintantly with forming an As-rich layer at the bulk-oxide interface.

scholarly journals In situ monitoring of the influence of water on DNA radiation damage by near-ambient pressure X-ray photoelectron spectroscopy

2021 ◽  
Vol 4 (1) ◽  
Author(s):  
Marc Benjamin Hahn ◽  
Paul M. Dietrich ◽  
Jörg Radnik
Keyword(s):  
Dna Damage ◽  
Radiation Damage ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
In Situ Monitoring ◽  
Strong Increase ◽  
Oh Radicals ◽  
Strand Breaks ◽  
X Ray

AbstractIonizing radiation damage to DNA plays a fundamental role in cancer therapy. X-ray photoelectron-spectroscopy (XPS) allows simultaneous irradiation and damage monitoring. Although water radiolysis is essential for radiation damage, all previous XPS studies were performed in vacuum. Here we present near-ambient-pressure XPS experiments to directly measure DNA damage under water atmosphere. They permit in-situ monitoring of the effects of radicals on fully hydrated double-stranded DNA. The results allow us to distinguish direct damage, by photons and secondary low-energy electrons (LEE), from damage by hydroxyl radicals or hydration induced modifications of damage pathways. The exposure of dry DNA to x-rays leads to strand-breaks at the sugar-phosphate backbone, while deoxyribose and nucleobases are less affected. In contrast, a strong increase of DNA damage is observed in water, where OH-radicals are produced. In consequence, base damage and base release become predominant, even though the number of strand-breaks increases further.

Quantitative analysis of saccharides by X-ray photoelectron spectroscopy

2009 ◽  
Vol 41 (6) ◽  
pp. 453-462 ◽  
Author(s):  
Joanna S. Stevens ◽  
Sven L. M. Schroeder
Keyword(s):  
Quantitative Analysis ◽  
Photoelectron Spectroscopy ◽  
X Ray

In situ Hard X-ray Photoelectron Spectroscopy on the Origin of Irreversibility in Electrochromic LixWO3 Thin Films

2021 ◽  
pp. 150898
Author(s):  
Makoto Takayanagi ◽  
Takashi Tsuchiya ◽  
Shigenori Ueda ◽  
Tohru Higuchi ◽  
Kazuya Terabe
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
X Ray
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