High‐field drift velocity of silicon inversion layers—a Monte Carlo calculation

1977 ◽  
Vol 48 (1) ◽  
pp. 350-353 ◽  
Author(s):  
P. K. Basu
1970 ◽  
Vol 13 (7) ◽  
pp. 1115-1117 ◽  
Author(s):  
J.L. Su ◽  
Y. Nishi ◽  
J.L. Moll ◽  
A. Neukermans

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 41-45 ◽  
Author(s):  
F. M. Bufler ◽  
P. Graf ◽  
B. Meinerzhagen

Monte Carlo results are presented for the velocity-field characteristics of holes in (i) unstrained Si, (ii) strained Si and (iii) strained SiGe using a full band model as well as an analytic nonparabolic and anisotropic band structure description. The full band Monte Carlo simulations show a strong enhancement of the drift velocity in strained Si up to intermediate fields, but yield the same saturation velocity as in unstrained Si. The drift velocity in strained SiGe is also significantly enhanced for low fields while being substantially reduced in the high-field regime. The results of the analytic band models agree well with the full band results up to medium field strengths and only the saturation velocity is significantly underestimated.


1972 ◽  
Vol 50 (6) ◽  
pp. 617-618
Author(s):  
L. G. Hart

A source of frequency-modulation (FM) noise in a free-running Gunn diode, due to fluctuations in valley population in the accumulation layer, is investigated using the results of recent Monte-Carlo high-field transport studies.


Author(s):  
Hui Houg Lau ◽  
Ing Hui Hii ◽  
Aaron Chii Enn Lee ◽  
M.Taghi Ahmadi ◽  
Razali Ismail ◽  
...  

1982 ◽  
Vol 41 (9) ◽  
pp. 857-859 ◽  
Author(s):  
D. F. Nelson ◽  
J. A. Cooper ◽  
A. R. Tretola

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