Tunable in situ growth of porous cubic silicon carbide thin films via methyltrichlorosilane-based chemical vapor deposition
Keyword(s):
1991 ◽
Vol 107
(1-4)
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pp. 699-704
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1992 ◽
Vol 193
(1-2)
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pp. 105-109
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Keyword(s):
1999 ◽
Vol 38
(Part 2, No. 6A/B)
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pp. L632-L635
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2003 ◽
Vol 13
(2)
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pp. 3233-3237
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Keyword(s):
1993 ◽
Vol 11
(4)
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pp. 1431-1434
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