Thallium‐doped silicon ionization and excitation levels by infrared absorption

1975 ◽  
Vol 46 (5) ◽  
pp. 2130-2133 ◽  
Author(s):  
Joseph H. Nevin ◽  
H. Thurman Henderson
1987 ◽  
Vol 36 (11) ◽  
pp. 1427
Author(s):  
DU YONG-CHANG ◽  
YAN MAO-XUN ◽  
ZHANG YU-FENG ◽  
GUO HAI ◽  
HU KE-LIANG

1968 ◽  
Vol 13 (10) ◽  
pp. 343-346 ◽  
Author(s):  
Frederick L. Vook ◽  
Herman J. Stein

2013 ◽  
Vol 205-206 ◽  
pp. 234-237
Author(s):  
Kevin Lauer ◽  
Christian Möller ◽  
Rudolf Porytskyy ◽  
Hartmuth Strutzberg ◽  
Dirk Schulze ◽  
...  

Infrared absorption spectra of highly nitrogen doped multicrystalline float zone silicon are reported. By measuring the nitrogen content in silicon using SIMS, a calibration function of the IR absorption coefficient at 963 cm-1(T = 300 K) and the nitrogen concentration is deduced:cN= (1.29 ± 0.05)×1017cm2α963. The calibration factor is 30 % less than the calibration factor reported by Y. Itoh et al. [Appl. Phys. Lett. 47 (1985) 488].


1962 ◽  
Vol 8 (12) ◽  
pp. 485-487 ◽  
Author(s):  
William E. Krag ◽  
Herbert J. Zeiger

2004 ◽  
Vol 79 (7) ◽  
pp. 1635-1641 ◽  
Author(s):  
C.H. Crouch ◽  
J.E. Carey ◽  
M. Shen ◽  
E. Mazur ◽  
F.Y. Génin

2009 ◽  
Vol 96 (2) ◽  
pp. 327-334 ◽  
Author(s):  
Brian R. Tull ◽  
Mark T. Winkler ◽  
Eric Mazur

1992 ◽  
Vol 83-87 ◽  
pp. 419-424 ◽  
Author(s):  
Hiroshi Yamada-Kaneta ◽  
Chioko Kaneta ◽  
Tsutomu Ogawa

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