The influence of copper top electrodes on the resistive switching effect in TiO2 thin films studied by conductive atomic force microscopy

2009 ◽  
Vol 95 (1) ◽  
pp. 013109 ◽  
Author(s):  
Lin Yang ◽  
Carsten Kuegeler ◽  
Krzysztof Szot ◽  
Andreas Ruediger ◽  
Rainer Waser
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Resistive Switching ◽  
Switching Effect ◽  
Tio2 Thin Films ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Resistive Switching Effect

EFFECT OF VERTICAL MECHANICAL COMPRESSION ON THE RESISTIVE SWITCHING CURRENTS OF TITANIUM DIOXIDE THIN FILMS

2012 ◽  
Vol 11 (04) ◽  
pp. 1240025
Author(s):  
MATHIEU MORETTI ◽  
MISCHA NICKLAUS ◽  
CHRISTIAN NAUENHEIM ◽  
ANDREAS RUEDIGER
Keyword(s):  
Thin Films ◽  
Resistive Switching ◽  
Switching Behavior ◽  
Mechanical Compression ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
External Bias ◽  
Atomic Force ◽  
Titanium Dioxide Thin Films ◽  
Probe Investigation

We report on a scanning probe investigation of the resistive switching behavior of TiO2 thin films as a function of an external bias voltage. Our initial conductive atomic force microscopy scans (c-AFM) on 30 nm thick films of sputtered TiO2 confirm the Ron–Roff ratio of approximately 4:1 reported in literature. After a tapping mode scan that compacts this layer by approximately 3%, a subsequent c-AFM scan reveals that the resistance in the compacted region has increased by a factor of 40 while the Ron–Roff ratio is only affected for small bias voltages.

Local photoconductivity of microcrystalline silicon thin films measured by conductive atomic force microscopy

2011 ◽  
Vol 5 (10-11) ◽  
pp. 373-375 ◽  
Author(s):  
Martin Ledinský ◽  
Antonín Fejfar ◽  
Aliaksei Vetushka ◽  
Jiří Stuchlík ◽  
Bohuslav Rezek ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Microcrystalline Silicon ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Silicon Thin Films ◽  
Atomic Force

Leakage currents at crystallites in ZrAlxOy thin films measured by conductive atomic-force microscopy

2007 ◽  
Vol 90 (23) ◽  
pp. 232901 ◽  
Author(s):  
O. Bierwagen ◽  
L. Geelhaar ◽  
X. Gay ◽  
M. Piešiņš ◽  
H. Riechert ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Conductive Atomic Force Microscopy ◽  
Leakage Currents ◽  
Force Microscopy ◽  
Atomic Force
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