Determining the CH3SO2→CH3+SO2 barrier from methylsulfonyl chloride photodissociation at 193 nm using velocity map imaging

2009 ◽  
Vol 131 (4) ◽  
pp. 044304 ◽  
Author(s):  
Britni J. Ratliff ◽  
Xiaonan Tang ◽  
Laurie J. Butler ◽  
David E. Szpunar ◽  
Kai-Chung Lau
Keyword(s):  
Velocity Map Imaging ◽  
193 Nm

Velocity-map imaging study of the O(3P)+N2 product channel following 193 nm photolysis of N2O

2003 ◽  
Vol 119 (2) ◽  
pp. 771-780 ◽  
Author(s):  
M. Brouard ◽  
A. P. Clark ◽  
C. Vallance ◽  
O. S. Vasyutinskii
Keyword(s):  
Imaging Study ◽  
Velocity Map Imaging ◽  
193 Nm

Photodissociation and multiphoton dissociative ionization processes in CH3S2CH3 at 193 nm studied using velocity-map imaging

2004 ◽  
Vol 120 (23) ◽  
pp. 11042-11052 ◽  
Author(s):  
B. Martı́nez-Haya ◽  
M. J. Bass ◽  
M. Brouard ◽  
C. Vallance ◽  
I. Torres ◽  
...  
Keyword(s):  
Dissociative Ionization ◽  
Velocity Map Imaging ◽  
Ionization Processes ◽  
193 Nm

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm
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