Role of donor defects in enhancing ferromagnetism of Cu-doped ZnO films

2009 ◽  
Vol 105 (10) ◽  
pp. 103914 ◽  
Author(s):  
Xiao-Li Li ◽  
Xiao-Hong Xu ◽  
Zhi-Yong Quan ◽  
Jun-Feng Guo ◽  
Hai-Shun Wu ◽  
...  
Keyword(s):  
Zno Films ◽  
Doped Zno

Variation of electrical properties in thickening Al-doped ZnO films: role of defect chemistry

RSC Advances ◽  
2016 ◽  
Vol 6 (54) ◽  
pp. 48910-48918 ◽  
Author(s):  
Chetan Singh ◽  
Emila Panda
Keyword(s):  
Electrical Properties ◽  
Defect Chemistry ◽  
Zno Films ◽  
Doped Zno

This study addresses the variation in electrical properties in a thickening Al-doped ZnO (AZO) film up to 348 nm and correlates this with its defect chemistry.

Ferromagnetism in Cu-doped ZnO films: Role of charge carriers

2008 ◽  
Vol 92 (6) ◽  
pp. 062509 ◽  
Author(s):  
Ashutosh Tiwari ◽  
Michael Snure ◽  
Dhananjay Kumar ◽  
Jeremiah T. Abiade
Keyword(s):  
Charge Carriers ◽  
Zno Films ◽  
Doped Zno

Workfunction of Al-Doped ZnO Films Deposited by Atomic Layer Deposition

2018 ◽  
Author(s):  
Peter George Gordon ◽  
Goran Bacic ◽  
Gregory P. Lopinski ◽  
Sean Thomas Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Ratio ◽  
Aluminum Concentration ◽  
Zno Films ◽  
Transparent Conductor ◽  
Kelvin Probe ◽  
Layer Deposition ◽  
Earth Abundant ◽  
Doped Zno

Al-doped ZnO (AZO) is a promising earth-abundant alternative to Sn-doped In<sub>2</sub>O<sub>3</sub> (ITO) as an n-type transparent conductor for electronic and photovoltaic devices; AZO is also more straightforward to deposit by atomic layer deposition (ALD). The workfunction of this material is particularly important for the design of optoelectronic devices. We have deposited AZO films with resistivities as low as 1.1 x 10<sup>-3</sup> Ωcm by ALD using the industry-standard precursors trimethylaluminum (TMA), diethylzinc (DEZ), and water at 200<sup>◦</sup>C. These films were transparent and their elemental compositions showed reasonable agreement with the pulse program ratios. The workfunction of these films was measured using a scanning Kelvin Probe (sKP) to investigate the role of aluminum concentration. In addition, the workfunction of AZO films prepared by two different ALD recipes were compared: a “surface” recipe wherein the TMA was pulsed at the top of each repeating AZO stack, and a interlamellar recipe where the TMA pulse was introduced halfway through the stack. As aluminum doping increases, the surface recipe produces films with a consistently higher workfunction as compared to the interlamellar recipe. The resistivity of the surface recipe films show a minimum at a 1:16 Al:Zn atomic ratio and using an interlamellar recipe, minimum resistivity was seen at 1:19. The film thicknesses were characterized by ellipsometry, chemical composition by EDX, and resistivity by four-point probe.<br>

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure

Cobalt doped ZnO films asantireflection coating application for solar cell

2020 ◽  
Author(s):  
M. Ismail. Fathima ◽  
K. S. Joseph Wilson ◽  
A. M. S. Arulanantham
Keyword(s):  
Solar Cell ◽  
Zno Films ◽  
Coating Application ◽  
Doped Zno
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