The effect of aluminum oxide incorporation on the material and electrical properties of hafnium oxide on Ge

2008 ◽  
Vol 93 (23) ◽  
pp. 233501 ◽  
Author(s):  
Monica Sawkar-Mathur ◽  
Ya-Chuan Perng ◽  
Jun Lu ◽  
Hans-Olof Blom ◽  
John Bargar ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Aluminum Oxide ◽  
Hafnium Oxide

scholarly journals An Investigation of the Electrical Behavior of Thermally Sprayed Aluminum Oxide

1996 ◽  
Author(s):  
C.J. Swindeman ◽  
R.D. Seals ◽  
W.P. Murray ◽  
M.H. Cooper ◽  
R.L. White
Keyword(s):  
Electrical Properties ◽  
Aluminum Oxide ◽  
Dielectric Constants ◽  
Electrical Behavior ◽  
X Ray Diffraction ◽  
Heating And Cooling ◽  
Thermally Sprayed Aluminum ◽  
Plasma Sprayed ◽  
And Control ◽  
Steel Substrates

Abstract Electrical properties of plasma-sprayed aluminum oxide coatings were measured at temperatures up to 600 °C. High purity (>99.5 wt% pure Al2O3) alumina powders were plasma-sprayed on stainless steel substrates over a range of power levels, using two gun configurations designed to attain different spray velocities. Key electrical properties were measured to evaluate the resultant coatings as potential insulating materials for electrostatic chucks (ESCs) being developed for semiconductor manufacturing. Electrical resistivity of all coatings was measured under vacuum upon heating and cooling over a temperature range of 20 to 600 °C. Dielectric constants were also measured under the same test conditions. X-ray diffraction was performed to examine phase formation in the coatings. Results show the importance of powder composition and careful selection and control of spray conditions for optimizing electrical behavior in plasma-sprayed aluminum oxide, and point to the need for further studies to characterize the relationship between high temperature electrical properties, measured plasma-spray variables, and specific microstructural and compositional coating features.

Electrical properties of aluminum oxide ceramics film on a metal

2021 ◽  
Vol 2 ◽  
pp. 59-65
Author(s):  
I. Yu. Bakeev ◽  
◽  
Yu. A. Burachevsky ◽  
E. S. Dvilis ◽  
D. B. Zolotukhin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electrical Properties ◽  
Aluminum Oxide ◽  
Relative Dielectric Constant ◽  
Plasma Electron ◽  
Electron Beam Evaporation ◽  
Original Method ◽  
Alumina Powder ◽  
Oxide Ceramic ◽  
Temperature Dependences

The work is devoted to the study of electrical properties (temperature dependences of conductivity, relative dielectric constant, dielectric loss tangent for various frequencies) of an aluminum oxide ceramic film deposited on a metal substrate. The film was created by the original method of electron beam evaporation of a non-conductive target, consisting of a compressed alumina powder, using a plasma electron source, which is able to reliably operate in the fore-vacuum pressure range (5 – 100 Pa). Such increased working gas pressures ensures the generation of a dense beam plasma near the target, which neutralizes the charging of a non-conducting target and thereby provides its effective melting and electron beam evaporation.

Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

2014 ◽  
Vol 301 ◽  
pp. 28-33 ◽  
Author(s):  
Magdalena Szymańska ◽  
Sylwia Gierałtowska ◽  
Łukasz Wachnicki ◽  
Marcin Grobelny ◽  
Katarzyna Makowska ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Hafnium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Structural And Electrical Properties

scholarly journals Electrical properties of high-pressure reactive sputtered thin hafnium oxide high-kgate dielectrics

2007 ◽  
Vol 22 (12) ◽  
pp. 1344-1351 ◽  
Author(s):  
S Dueñas ◽  
H Castán ◽  
H García ◽  
A Gómez ◽  
L Bailón ◽  
...  
Keyword(s):  
High Pressure ◽  
Electrical Properties ◽  
Hafnium Oxide
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