Depth Profiling of N and C in Ion Implanted ZnO and Si Using Deuterium Induced Nuclear Reaction Analysis

2008 ◽  
Author(s):  
John Kennedy ◽  
Peter Murmu ◽  
Andreas Markwitz ◽  
Edmund G. Seebauer ◽  
Susan B. Felch ◽  
...  
Keyword(s):  
Nuclear Reaction ◽  
Depth Profiling ◽  
Nuclear Reaction Analysis ◽  
Ion Implanted

Light Impurity Depth Profiling in the Nuclear Reaction AnalysiS

1993 ◽  
Vol 316 ◽  
Author(s):  
Oleg I. Zabashta ◽  
A.I. Kul'ment'ev ◽  
V.E. Storizko
Keyword(s):  
Nuclear Reaction ◽  
Depth Profile ◽  
General Problem ◽  
Depth Profiling ◽  
Measured Data ◽  
Point Of View ◽  
Nuclear Reaction Analysis ◽  
Incorrect Problem ◽  
Non Destructive ◽  
Non Destructive Techniques

The general problem in the analysis of a sample by non-destructive techniques such as nuclear microanalysis, ellipsometry, etc. is the interpretation of the measured data. The impurity depth profile obtained may noticeable non-physical fluctuations. From the mathematical point of view this could be explain by the fact that while interpreting the results we have to solve an incorrect problem to which routine computational methods are not applicable.

A Nuclear Reaction Analysis Technique to Determine The Penetration of Hydrogenic Species into Glasses Exposed to Leaching Solutions

1984 ◽  
Vol 44 ◽  
Author(s):  
L. M. Gignac ◽  
C. J. Altstetter ◽  
S. D. Brown
Keyword(s):  
Nuclear Reaction ◽  
Heavy Water ◽  
Depth Profiling ◽  
New Technique ◽  
Nuclear Reaction Analysis ◽  
Water Solutions ◽  
Analysis Technique ◽  
A New Technique

AbstractNuclear reaction analysis is discussed as a method for determining the distribution of deuterium beneath the surfaces of glasses exposed to heavy water solutions for various times and temperatures. Limited examples of both conventional depth profiling for deuterium and a new technique for deuterium mapping are presented. The possible use of deuterium mapping for investigating the kinetics and mechanisms of the leaching of glasses is discussed.

Depth profiling of oxygen in oxide films by 18O(p,α)15N nuclear reaction analysis

2011 ◽  
Vol 294 (3) ◽  
pp. 401-404 ◽  
Author(s):  
G. L. N. Reddy ◽  
Pritty Rao ◽  
J. V. Ramana ◽  
S. Vikramkumar ◽  
V. S. Raju ◽  
...  
Keyword(s):  
Nuclear Reaction ◽  
Oxide Films ◽  
Depth Profiling ◽  
Nuclear Reaction Analysis

Helium Behaviour in Fe-Base Materials: Thermal Desorption and Nuclear Reaction Analyses

2012 ◽  
Vol 323-325 ◽  
pp. 221-226 ◽  
Author(s):  
Hélène Lefaix-Jeuland ◽  
Sandrine Miro ◽  
Fabrice Legendre
Keyword(s):  
Nuclear Reaction ◽  
Thermal Desorption ◽  
Depth Profiling ◽  
Bulk Diffusion ◽  
Thermal Desorption Spectroscopy ◽  
Reaction Model ◽  
Nuclear Reaction Analysis ◽  
Helium Bubbles ◽  
Base Materials ◽  
Complementary Set

Polycrystalline Fe 99.95 and 99.5 samples were implanted with helium at 8 keV and 3 MeV. Thermal Desorption Spectroscopy (TDS) and Nuclear Reaction Analysis (NRA) provided a complementary set of techniques to characterize helium-materials interactions within two different implantation depths, respectively close to the surface and in the bulk. Using TDS, it was possible to get information about the nature and the states of the structures where helium was trapped in radiation damaged Fe specimens. Activation energies for every trapping site (mono-vacancies, clusters) have been determined from conventional reaction model. The effect of interstitial carbon was also discussed, and compared with previous ab-initio studies. Moreover, the helium bulk diffusion constants in radiation damaged structures could be derived from non destructive 3He depth profiling. Preliminary observations highlighted that a few part of He remained trapped while helium bubbles migrated in the bulk.

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