Synchrotron radiation photoemission spectroscopic study of band offsets and interface self-cleaning by atomic layer deposited HfO2 on In0.53Ga0.47As and In0.52Al0.48As
2008 ◽
2010 ◽
Vol 248
(4)
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pp. 956-959
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Keyword(s):
2011 ◽
Vol 88
(7)
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pp. 1101-1104
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2011 ◽
Vol 11
(5)
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pp. 4328-4332
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2010 ◽
Vol 130
(10)
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pp. 1817-1818
1988 ◽