scholarly journals Cavity ring-down spectroscopy sensor for ion beam etch monitoring and end-point detection of multilayer structures

2008 ◽  
Vol 79 (11) ◽  
pp. 115107 ◽  
Author(s):  
L. Tao ◽  
A. P. Yalin ◽  
N. Yamamoto
Keyword(s):  
Ion Beam ◽  
Multilayer Structures ◽  
Cavity Ring Down Spectroscopy ◽  
End Point ◽  
End Point Detection ◽  
Point Detection ◽  
Cavity Ring Down

Electrical end-point detection during ion beam etching of thin films and multilayers

1995 ◽  
Vol 8 (8) ◽  
pp. 676-679 ◽  
Author(s):  
A Matthes ◽  
F Schmidl ◽  
K -U Barholz ◽  
F Elschner ◽  
H Schneidewind ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Etching ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

End point detection in ion beam milling of YBa2Cu3O7thin films

1992 ◽  
Vol 61 (2) ◽  
pp. 228-230 ◽  
Author(s):  
R. G. Humphreys ◽  
N. G. Chew ◽  
S. F. Morgan ◽  
J. S. Satchell ◽  
A. G. Cullis ◽  
...  
Keyword(s):  
Ion Beam ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

Focused Ion Beam Sims for Micromachining Applications

1987 ◽  
Vol 101 ◽  
Author(s):  
L. R. Harriott ◽  
M. J. Vasile
Keyword(s):  
Focused Ion Beam ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
High Yield ◽  
Ion Milling ◽  
End Point ◽  
Glass Interface ◽  
End Point Detection ◽  
Point Detection ◽  
Secondary Ion

ABSTRACTA secondary ion mass spectrometry (SIMS) system has been incorporated into the AT&T-BL second generation focused ion beam (FIB) micromachining system. The primary applications are end-point detection and topographical element mapping. End-point detection of Cr micromachining on photomasks was done with raster sizes ranging from 10 μm x 10 μm to 3 μm x 3 μm. SIMS end-points, total ions images, and transmitted light measurements show that the ion-milling can be controlled to stop prior to or after the Cr/glass interface. Mass selected secondary ion images have been obtained for high yield ions such as52Cr+ and27 A1+ on raster fields of 25 μm in time intervals ranging from 20 to 100 sec. Al+ SIMS images of 1 μm lines and spaces from a VLSI test pattern have been obtained.

Second Order Effect Monitoring During Backside Milling for Functional End Point Detection

2019 ◽  
Author(s):  
Anthony George ◽  
Isaac Goldthwaite ◽  
Katie Liszewski ◽  
Jeremiah Schley ◽  
Thomas Kent
Keyword(s):  
Integrated Circuit ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Second Order ◽  
Order Effects ◽  
Back Side ◽  
End Point ◽  
End Point Detection ◽  
Second Order Effects ◽  
Point Detection

Abstract Backside silicon removal provides an avenue for a number of modern non-destructive and circuit edit techniques. Visible light microscopy, electron beam microscopy, and focused ion beam circuit edit benefit from a removal of back side silicon from the integrated circuit being examined. Backside milling provides a potential path for rapid sample preparation when thinned or ultrathinned samples are required. However, backside milling is an inherently destructive process and can damage the device function, rendering it no longer useful for further nondestructive analysis. Recent methods of backside milling do not guarantee device functionality at a detected end point without a priori knowledge. This work presents a methodology for functional end point detection during backside milling of integrated circuit packaging. This is achieved by monitoring second order effects in response to applied device strain, which guide the milling procedure, avoiding destructive force as the backside material is removed. Experimental data suggest a correlation between device power consumption waveforms and second order effects which inform an in situ functional end point. Keywords: functional end point, side-channel analysis, backside thinning, milling, machine learning, second order effects

Further improvements in end point detection using a wide angle ion beam source

Vacuum ◽  
1988 ◽  
Vol 38 (6) ◽  
pp. 499-500 ◽  
Author(s):  
AB Dean ◽  
M Heath ◽  
M Brayford
Keyword(s):  
Ion Beam ◽  
Wide Angle ◽  
Beam Source ◽  
End Point ◽  
End Point Detection ◽  
Point Detection
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