High-mobility microcrystalline silicon thin-film transistors prepared near the transition to amorphous growth

2008 ◽  
Vol 104 (5) ◽  
pp. 054506 ◽  
Author(s):  
Kah-Yoong Chan ◽  
Dietmar Knipp ◽  
Aad Gordijn ◽  
Helmut Stiebig
2007 ◽  
Vol 989 ◽  
Author(s):  
Kah Yoong Chan ◽  
Eerke Bunte ◽  
Helmut Stiebig ◽  
Dietmar Knipp

AbstractMicrocrystalline silicon (mc-Si:H) has recently been proven to be a promising material for thin-film transistors (TFTs). We present mc-Si:H TFTs fabricated by plasma-enhanced chemical vapor deposition at temperatures below 200°C in a condition similar to the fabrication of amorphous silicon TFTs. The mc-Si:H TFTs exhibit device mobilities exceeding 30 cm2/Vs and threshold voltages in the range of 2.5V. Such high mobilities are observed for long channel devices (50-200 mm). For short channel device (2 mm), the mobility reduces to 7 cm2/Vs. Furthermore the threshold voltage of the TFTs decreases with decreasing channel length. A simple model is developed, which explains the observed reduction of the device mobility and threshold voltage with decreasing channel length by the influence of drain and source contacts.


2008 ◽  
Vol 52 (6) ◽  
pp. 914-918 ◽  
Author(s):  
Kah-Yoong Chan ◽  
Eerke Bunte ◽  
Dietmar Knipp ◽  
Helmut Stiebig

2012 ◽  
Vol 8 (1) ◽  
pp. 27-34 ◽  
Author(s):  
Anita Risteska ◽  
Kah-Yoong Chan ◽  
Aad Gordijn ◽  
Helmut Stiebig ◽  
Dietmar Knipp

2008 ◽  
Vol 52 (3) ◽  
pp. 432-435 ◽  
Author(s):  
Maher Oudwan ◽  
Alexey Abramov ◽  
Pere Roca i Cabarrocas ◽  
François Templier

2010 ◽  
pp. NA-NA
Author(s):  
O. Moustapha ◽  
A. Abramov ◽  
D. Daineka ◽  
M. Oudwan ◽  
Y. Bonnassieux ◽  
...  

2006 ◽  
Vol 55 (12) ◽  
pp. 6612
Author(s):  
Li Juan ◽  
Wu Chun-Ya ◽  
Zhao Shu-Yun ◽  
Liu Jian-Ping ◽  
Meng Zhi-Guo ◽  
...  

2007 ◽  
Vol 91 (2) ◽  
pp. 022113 ◽  
Author(s):  
M. C. Wang ◽  
T. C. Chang ◽  
Po-Tsun Liu ◽  
R. W. Xiao ◽  
L. F. Lin ◽  
...  

2007 ◽  
Vol 515 (19) ◽  
pp. 7585-7589 ◽  
Author(s):  
T. Pier ◽  
K. Kandoussi ◽  
C. Simon ◽  
N. Coulon ◽  
H. Lhermite ◽  
...  

2009 ◽  
Vol 96 (3) ◽  
pp. 751-758
Author(s):  
Kah-Yoong Chan ◽  
Elias Hashem ◽  
Aad Gordijn ◽  
Helmut Stiebig ◽  
Dietmar Knipp

Sign in / Sign up

Export Citation Format

Share Document