Inversion-channel GaN metal-oxide-semiconductor field-effect transistor with atomic-layer-deposited Al2O3 as gate dielectric

2008 ◽  
Vol 93 (5) ◽  
pp. 053504 ◽  
Author(s):  
Y. C. Chang ◽  
W. H. Chang ◽  
H. C. Chiu ◽  
L. T. Tung ◽  
C. H. Lee ◽  
...  
2009 ◽  
Vol 105 (11) ◽  
pp. 114510 ◽  
Author(s):  
A. Pérez-Tomás ◽  
M. Placidi ◽  
X. Perpiñà ◽  
A. Constant ◽  
P. Godignon ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document