Inversion-channel GaN metal-oxide-semiconductor field-effect transistor with atomic-layer-deposited Al2O3 as gate dielectric
2011 ◽
Vol 29
(3)
◽
pp. 03C122
◽
2006 ◽
Vol 135
(3)
◽
pp. 282-284
◽
Keyword(s):
2001 ◽
Vol 40
(Part 2, No. 11B)
◽
pp. L1201-L1203
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