Soft x-ray measurements using photoconductive type-IIa and single-crystal chemical vapor deposited diamond detectors

2008 ◽  
Vol 79 (10) ◽  
pp. 10E923 ◽  
Author(s):  
A. S. Moore ◽  
C. D. Bentley ◽  
J. M. Foster ◽  
G. Goedhart ◽  
P. Graham ◽  
...  
Keyword(s):  
Single Crystal ◽  
Chemical Vapor ◽  
Crystal Chemical ◽  
X Ray ◽  
Chemical Vapor Deposited

scholarly journals Optical properties of epitaxial single-crystal chemical-vapor-deposited diamond

2007 ◽  
Author(s):  
Giorgio Turri ◽  
Ying Chen ◽  
Michael Bass ◽  
David Orchard ◽  
James E. Butler ◽  
...  
Keyword(s):  
Optical Properties ◽  
Single Crystal ◽  
Chemical Vapor ◽  
Crystal Chemical ◽  
Chemical Vapor Deposited

Studies of the Coefficient of Thermal Expansion of Low-k ILD Materials by X-Ray Reflectivity

2006 ◽  
Vol 914 ◽  
Author(s):  
George Andrew Antonelli ◽  
Tran M. Phung ◽  
Clay D. Mortensen ◽  
David Johnson ◽  
Michael D. Goodner ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Expansion ◽  
Coefficient Of Thermal Expansion ◽  
Chemical Vapor ◽  
Dielectric Materials ◽  
Free Standing ◽  
Dielectric Thin Films ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Low K

AbstractThe electrical and mechanical properties of low-k dielectric materials have received a great deal of attention in recent years; however, measurements of thermal properties such as the coefficient of thermal expansion remain minimal. This absence of data is due in part to the limited number of experimental techniques capable of measuring this parameter. Even when data does exist, it has generally not been collected on samples of a thickness relevant to current and future integrated processes. We present a procedure for using x-ray reflectivity to measure the coefficient of thermal expansion of sub-micron dielectric thin films. In particular, we elucidate the thin film mechanics required to extract this parameter for a supported film as opposed to a free-standing film. Results of measurements for a series of plasma-enhanced chemical vapor deposited and spin-on low-k dielectric thin films will be provided and compared.

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