In situ estimation of thin film growth rate, complex refractive index, and roughness during chemical vapor deposition using a modified moving horizon estimator

2008 ◽  
Vol 103 (12) ◽  
pp. 124901 ◽  
Author(s):  
Rentian Xiong ◽  
Martha A. Grover
Keyword(s):  
Thin Film ◽  
Growth Rate ◽  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Complex Refractive Index ◽  
Chemical Vapor ◽  
Thin Film Growth

Observation of Film Growth Phenomena Using Micromachined Structures

1996 ◽  
Vol 441 ◽  
Author(s):  
F. DiMeo ◽  
R. E. Cavicchi ◽  
S. Sernancik ◽  
J. S. Suchle ◽  
N. H. Tea ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Electrical Properties ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Materials Processing ◽  
Semiconducting Oxides

AbstractA method of studying thin film growth and materials processing using micromachined Si-based structures is presented. The microsubstrate platforms (called “microhotplates”) allow temperature control during deposition, andin situmonitoring of the electrical properties of connected coatings. The efficiency of the approach is amplified when multiple. Independentlyoperated elements are used in array configurations. Illustrations here involve chemical vapor deposition of semiconducting oxides, but the methodology can be employed to investigate the growth of other classes of materials as well.

Effect of hydrogen atmosphere in Cu thin film growth by chemical vapor deposition using Cu(dmamb)2

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hydrogen Atmosphere ◽  
Thin Film Growth ◽  
Cu Thin Film

Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

1990 ◽  
Vol 8 (3) ◽  
pp. 1864-1870 ◽  
Author(s):  
John E. Crowell ◽  
Laura L. Tedder ◽  
Hee‐Chuen Cho ◽  
Frank M. Cascarano ◽  
Mark A. Logan
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Dielectric Thin Film ◽  
Model Studies

Role of solvents in chemical vapor deposition: implications for copper thin-film growth

1993 ◽  
Vol 97 (45) ◽  
pp. 11781-11786 ◽  
Author(s):  
Chao Ming Chiang ◽  
Timothy M. Miller ◽  
Lawrence H. Dubois
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Copper Thin Film

Development of a new laser heating system for thin film growth by chemical vapor deposition

2012 ◽  
Vol 83 (9) ◽  
pp. 094701 ◽  
Author(s):  
Eiji Fujimoto ◽  
Masatomo Sumiya ◽  
Tsuyoshi Ohnishi ◽  
Mikk Lippmaa ◽  
Masaki Takeguchi ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Laser Heating ◽  
Film Growth ◽  
Chemical Vapor ◽  
Heating System ◽  
Thin Film Growth
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