Characterization of AlN metal-semiconductor-metal diodes in the spectral range of 44–360nm: Photoemission assessments

2008 ◽  
Vol 92 (2) ◽  
pp. 022108 ◽  
Author(s):  
A. BenMoussa ◽  
J. F. Hochedez ◽  
R. Dahal ◽  
J. Li ◽  
J. Y. Lin ◽  
...  
1988 ◽  
Vol 49 (C4) ◽  
pp. C4-325-C4-328
Author(s):  
M. ZIRNGIBL ◽  
R. SACHOT ◽  
M. ILEGEMS

AIP Advances ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 065130
Author(s):  
Henning Fouckhardt ◽  
Christoph Doering ◽  
Michael Jaax ◽  
Bert Laegel

1989 ◽  
Vol 148 ◽  
Author(s):  
Zuzanna Liliental-Weber ◽  
Raymond P. Mariella

ABSTRACTTransmission electron microscopy of GaAs grown on Si for metal-semiconductor-metal photodetectors is presented in this paper. Two kinds of samples are compared: GaAs grown on a 15 Å Si epilayer grown on GaAs, and GaAs grown at low temperature (300°C) on Si substrates. It is shown that the GaAs epitaxial layer grown on thin Si layer has reverse polarity to the substrate (antiphase relation). Higher defect density is observed for GaAs grown on Si substrate. This higher defect density correlates with an increased device speed, but with reduced sensitivity.


1994 ◽  
Vol 33 (Part 1, No. 1B) ◽  
pp. 844-847 ◽  
Author(s):  
Markus Sickmöller ◽  
Peter Urbach ◽  
Wolfgang Kowalsky

2016 ◽  
Vol 68 (1) ◽  
Author(s):  
Alessandro Maturilli ◽  
Jörn Helbert ◽  
Sabrina Ferrari ◽  
Björn Davidsson ◽  
Mario D’Amore

PLoS ONE ◽  
2016 ◽  
Vol 11 (1) ◽  
pp. e0145423 ◽  
Author(s):  
Hassan Maktuff Jaber Al-Ta’ii ◽  
Vengadesh Periasamy ◽  
Yusoff Mohd Amin

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