Epitaxial growth of PbFe12O19 thin films by alternating target laser ablation deposition of Fe2O3 and PbO

2007 ◽  
Vol 101 (9) ◽  
pp. 09M510 ◽  
Author(s):  
A. L. Geiler ◽  
Y. He ◽  
S. D. Yoon ◽  
A. Yang ◽  
Y. Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Epitaxial Growth

Epitaxial growth and magnetic properties of RM5 thin films (R=rare earth, M=Ni,Co,Fe) prepared by laser ablation deposition (abstract)

1991 ◽  
Vol 69 (8) ◽  
pp. 5677-5677 ◽  
Author(s):  
J. P. Gavigan ◽  
D. Givord ◽  
A. Lienard ◽  
J. P. Rebouillat ◽  
Y. Souche
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Rare Earth ◽  
Laser Ablation ◽  
Epitaxial Growth

scholarly journals Epitaxial growth of BaRuO3 thin films on MgO substrates by laser ablation

2009 ◽  
Vol 117 (1364) ◽  
pp. 426-430
Author(s):  
Akihiko ITO ◽  
Hiroshi MASUMOTO ◽  
Takashi GOTO ◽  
Shunichi SATO
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Epitaxial Growth

Epitaxial growth of conductive LaNiO3 thin films by pulsed laser ablation

1996 ◽  
Vol 26 (1-2) ◽  
pp. 73-76 ◽  
Author(s):  
Tao Yu ◽  
Yan-Feng Chen ◽  
Zhi-Guo Liu ◽  
Xiao-Yuan Chen ◽  
Li Sun ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Epitaxial Growth ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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