He induced nanovoids for point-defect engineering in B-implanted crystalline Si

2007 ◽  
Vol 101 (2) ◽  
pp. 023515 ◽  
Author(s):  
E. Bruno ◽  
S. Mirabella ◽  
F. Priolo ◽  
E. Napolitani ◽  
C. Bongiorno ◽  
...  
2004 ◽  
Vol 96 (1) ◽  
pp. 919-921 ◽  
Author(s):  
Lin Shao ◽  
John Chen ◽  
Jianming Zhang ◽  
D. Tang ◽  
Sanjay Patel ◽  
...  

Author(s):  
Shigeo Onishi ◽  
Akitsu Ayukawa ◽  
Keiichiro Uda ◽  
Keizo Sakiyama

2003 ◽  
Vol 792 ◽  
Author(s):  
Wei-Kan Chu ◽  
Lin Shao ◽  
Jiarui Liu

ABSTRACTAnomalous diffusion of boron during annealing is a detriment on the fabrication of ultrashallow junction required by the next generation Si devices. This has driven the need to develop new doping methods. In the point defect engineering approach, high-energy ion bombardments inject vacancies near the surface region and create excessive interstitials near the end of projected range of incident ions. Such manipulation of point defects can retard boron diffusion and enhance activation of boron. We will review the current understanding of boron diffusion and our recent activities in point defect engineering.


2016 ◽  
Vol 5 (3) ◽  
pp. 158-169 ◽  
Author(s):  
Moritz to Baben ◽  
Marcus Hans ◽  
Daniel Primetzhofer ◽  
Simon Evertz ◽  
Holger Ruess ◽  
...  

2005 ◽  
Vol 108-109 ◽  
pp. 365-372 ◽  
Author(s):  
Koji Sueoka ◽  
S. Shiba ◽  
S. Fukutani

Theoretical consideration for technologically important phenomena in defect engineering of Czochralski silicon was performed with first principles calculation. (i) Point defect behaviour during crystal growth, (ii) enhanced oxygen precipitation in p/p+ epitaxial wafers, and (iii) Cu gettering by impurities are main topics in this work. Following results are obtained. (i) Interstitial Si I is dominant in p type Si while vacancy V is dominant in n type Si during crystal growth when dopant concentration is higher than about 1x1019atoms/cm3. (ii) In initial stage of oxygen precipitation including a few interstitial oxygen (O) atoms, BOn complex is more stable than On complex. The diffusion barrier of O atom in p+ Si is reduced to about 2.2eV compared with the barrier of about 2.5eV in intrinsic Si. (iii) In substitutional B, Sb, As, P and C atoms, only B atom can be an effective gettering center for Cu.


MRS Bulletin ◽  
1991 ◽  
Vol 16 (12) ◽  
pp. 18-21
Author(s):  
David Seidman ◽  
Donglu Shi

This issue of the MRS Bulletin follows up on the November issue's five articles on point defect phenomena in a wide range of materials with five more articles on point defects. The present articles emphasize the behavior of different phenomena in various materials—nonstoichiometric metal oxides, intermetallic compounds, type II superconductors and semiconductors—in terms of fundamental properties of point defects. Again, point defects is the unifying theme but the emphasis shifts to material behavior.This issue begins with Marshall Stoneham's article on the roles theory plays in predicting and understanding material behavior in terms of point defects in the different classes of materials. The following article by Rüdiger Dieckmann discusses the relationships between point defect concentrations in nonstoichiometric metal oxides and diffusion, i.e., mass transport. Next, Georges Martin and Pascal Bellon review their new approach for analyzing the role played by antisite defects in nonequilibrium phase transitions in intermetallic compounds. Then, Donglu Shi focuses on the effect of point, line, and planar defects on three major properties of type II superconductors—the critical transition temperature, the upper critical magnetic field, and the critical current density. Finally, Lionel Kimerling shows how defect engineering is used to achieve a high degree of complexity in product fabrication and greater sophistication in product performance; he illustrates what he means by defect engineering with examples from basic processes used in electronic materials processing.


2003 ◽  
Vol 42 (3-4) ◽  
pp. 65-114 ◽  
Author(s):  
Lin Shao ◽  
Jiarui Liu ◽  
Quark Y. Chen ◽  
Wei-Kan Chu

2007 ◽  
Vol 90 (6) ◽  
pp. 062107 ◽  
Author(s):  
Ning Kong ◽  
Sanjay K. Banerjee ◽  
Taras A. Kirichenko ◽  
Steven G. H. Anderson ◽  
Mark C. Foisy

2016 ◽  
Vol 36 (16) ◽  
pp. 4039-4048 ◽  
Author(s):  
E. Berganza ◽  
C. Pascual-González ◽  
H. Amorín ◽  
A. Castro ◽  
M. Algueró

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