Investigation of void nucleation and propagation during electromigration of flip-chip solder joints using x-ray microscopy

2006 ◽  
Vol 89 (26) ◽  
pp. 262106 ◽  
Author(s):  
S. H. Chiu ◽  
Chih Chen
2008 ◽  
Vol 1116 ◽  
Author(s):  
Kai Chen ◽  
Nobumichi Tamura ◽  
King-Ning Tu

AbstractThe rotation of Sn grains in Pb-free flip chip solder joints hasn't been reported in literature so far although it has been observed in Sn strips. In this letter, we report the detailed study of the grain orientation evolution induced by electromigration by synchrotron based white beam X-ray microdiffraction. It is found that the grains in solder joint rotate more slowly than in Sn strip even under higher current density. On the other hand, based on our estimation, the reorientation of the grains in solder joints also results in the reduction of electric resistivity, similar to the case of Sn strip. We will also discuss the reason why the electric resistance decreases much more in strips than in the Sn-based solders, and the different driving force for the grain growth in solder joint and in thin film interconnect lines.


Author(s):  
Hiroyuki Tsuritani ◽  
Toshihiko Sayama ◽  
Yoshiyuki Okamoto ◽  
Takeshi Takayanagi ◽  
Kentaro Uesugi ◽  
...  

The reliability and lifetime of micro-joints on printed circuit boards (PCBs) is significantly affected by fatigue processes, including fatigue crack initiation and propagation to failure. Accordingly, the industries producing electronic devices and components strongly desire the development of a new nondestructive inspection technology, which detects micro-cracks appearing as thermal fatigue fractures in these joints. Accordingly, the authors have demonstrated that the micro-cracks in the micro-solder joints can be observed using the SP-μCT synchrotron X-ray micro tomography system. However, in order for such solder joint micro-cracks to be observable by SP-μCT, the observation object must have a diameter of less than roughly 1 mm. In this investigation, we applied a synchrotron radiation X-ray laminography system to three-dimensionally and nondestructively evaluate the fatigue crack propagation process in flip chip solder micro-joints. X-ray laminography is a technique for nondestructively observing planar objects. The optical system developed for use in X-ray laminography was constructed to provide the rotation stage with a 20° tilt from the horizontally incident X-ray beam. For this reason, X-rays were sufficiently transmitted through the planar object, in all directions. The observed specimens had a flip chip structure, in which a 10.04 mm square LSI chip is connected to a 52.55 mm (length) × 30.0 mm (width) FR-4 substrate by 120 μm diameter Sn-3.0wt%Ag-0.5wt%Cu lead-free solder bumps. A thermal cycle test was carried out, and specimens were collected at fixed cycle numbers. The same solder joints were observed successively using the synchrotron radiation X-ray laminography system at beamline BL20XU at SPring-8, the largest synchrotron radiation facility in Japan. An X-ray beam energy of 29.0 keV was selected to obtain laminography images with high contrast among component. The obtained laminography images clearly show the evolution of cracks, voids, and the Ag3Sn phase due to the thermal cyclic loading of the solder joints. In addition, the surface area of the same fatigue cracks was also measured, to quantify the crack propagation process. However, the surface area change measured by laminography differed from the crack propagation results obtained by standard SP-μCT. This difference may be due to an inability to observe some micro-cracks, due to crack closure to beneath than the detection limit of synchrotron radiation X-ray laminography. Consequently, these results demonstrate the possibility that nondestructive observation of fatigue cracks in the solder bumps on a large size electronic substrate by synchrotron radiation X-ray laminography, although its detection ability for narrow cracks may be limited, compared to SP-μCT.


2011 ◽  
Vol 65 (7) ◽  
pp. 646-649 ◽  
Author(s):  
Tian Tian ◽  
Kai Chen ◽  
A.A. MacDowell ◽  
Dula Parkinson ◽  
Yi-Shao Lai ◽  
...  

2004 ◽  
Vol 127 (2) ◽  
pp. 157-163 ◽  
Author(s):  
C. Basaran ◽  
H. Ye ◽  
D. C. Hopkins ◽  
D. Frear ◽  
J. K. Lin

The failure modes of flip chip solder joints under high electrical current density are studied experimentally. Three different failure modes are reported. Only one of the failure modes is caused by the combined effect of electromigration and thermomigration, where void nucleation and growth contribute to the ultimate failure of the module. The Ni under bump metallization–solder joint interface is found to be the favorite site for void nucleation and growth. The effect of pre-existing voids on the failure mechanism of a solder joint is also investigated


Author(s):  
Hua Ye ◽  
Cemal Basaran ◽  
Douglas Hopkins

The electromigration damage in flip chip solder joints of eutectic SnPb was studied under current stressing at room temperature with the current density about 1.3×104A/cm2. The diameter of the solder joints was about 140μm. The mass accumulation near anode side and void nucleation near cathode were observed during current stressing. The nano-indentation test was first time done on solder joints for electromigration test. Surface marker movement was used to measure the atomic flux driven by electromigration and to calculate the product of effective charge number and diffusivity, DxZ*, of the solder at room temperature. The effective charge number can be extracted with the solder diffusivity at room temperature known.


2010 ◽  
Vol 1249 ◽  
Author(s):  
Hsiang Yao Hsiao ◽  
Chih Chen ◽  
D. J. Yao

AbstractThe Joule heating effect at various stages under electromigration of flip-chip Sn3.5Ag solder joints was investigated under a current of 0.5 A at 100°C. During various stages of electromigration, voids may form and propagate and Joule heating effect may vary at different void sizes. To verify the void nucleation and propagation on Joule heating effect during electromigration process, the solder bump was stressed for different lengths of time and then examined by Kelvin bump probes and infrared microscopy. We found that voids started to form at approximately 1.2 times of the initial bump resistance. Then the voids propagated when the bump resistance increased. In addition, the temperature of the solder joints increased with the bump resistance and the increase of current stressing time. It increased very slowly in initial stages. In the last stage, the temperature of the solder bump increased rapidly due to the increase of the bump resistance and the local Joule heating effect.


Author(s):  
Carlo Grilletto ◽  
Steve Hsiung ◽  
Andrew Komrowski ◽  
John Soopikian ◽  
Daniel J.D. Sullivan ◽  
...  

Abstract This paper describes a method to "non-destructively" inspect the bump side of an assembled flip-chip test die. The method is used in conjunction with a simple metal-connecting "modified daisy chain" die and makes use of the fact that polished silicon is transparent to infra-red (IR) light. The paper describes the technique, scope of detection and examples of failure mechanisms successfully identified. It includes an example of a shorting anomaly that was not detectable with the state of the art X-ray equipment, but was detected by an IR emission microscope. The anomalies, in many cases, have shown to be the cause of failure. Once this has been accomplished, then a reasonable deprocessing plan can be instituted to proceed with the failure analysis.


2011 ◽  
Vol 99 (8) ◽  
pp. 082114 ◽  
Author(s):  
Tian Tian ◽  
Feng Xu ◽  
Jung Kyu Han ◽  
Daechul Choi ◽  
Yin Cheng ◽  
...  

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