Characterization of DC Magnetron Sputtering Plasma Used for Deposition of Amorphous Carbon Nitride
2001 ◽
Vol 181
(3-4)
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pp. 331-338
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2001 ◽
Vol 175-176
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pp. 525-530
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2001 ◽
Vol 206-213
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pp. 531-534
1999 ◽
Vol 8
(6)
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pp. 993-995
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Keyword(s):
2006 ◽
Vol 15
(4-8)
◽
pp. 1015-1018
◽
Keyword(s):
Keyword(s):