scholarly journals Irreversibility line and low-field grain-boundary pinning in electron-doped superconducting thin films

2006 ◽  
Vol 100 (12) ◽  
pp. 123903 ◽  
Author(s):  
S. Sergeenkov ◽  
A. J. C. Lanfredi ◽  
F. M. Araujo-Moreira
2001 ◽  
Vol 89 (11) ◽  
pp. 6970-6972 ◽  
Author(s):  
N. K. Todd ◽  
N. D. Mathur ◽  
M. G. Blamire

1999 ◽  
Vol 562 ◽  
Author(s):  
J. M. E. Harper ◽  
C. Cabral ◽  
P. C. Andricacos ◽  
L. Gignac ◽  
I. C. Noyan ◽  
...  

ABSTRACTWe present a model which accounts for the dramatic evolution in the microstructure of electroplated copper thin films near room temperature. Microstructure evolution occurs during a transient period of hours following deposition, and includes an increase in grain size, changes in preferred crystallographic texture, and decreases in resistivity, hardness and compressive stress. As the grain size increases from the as-deposited value of 0.05–0.1 μm up to several μm, the decreasing grain boundary contribution to electron scattering lowers the resistivity by tens of percent to near-bulk values. Concurrently, as the volume of grain boundaries decreases, the stress is shown to change in the tensile direction by tens of MPa. The as-deposited grain size is also shown to be consistent with grain boundary pinning.


1999 ◽  
Vol 564 ◽  
Author(s):  
J. M. E. Harper ◽  
C. Cabral ◽  
P. C. Andricacos ◽  
L. Gignac ◽  
I. C. Noyan ◽  
...  

AbstractWe present a model which accounts for the dramatic evolution in the microstructure of electroplated copper thin films near room temperature. Microstructure evolution occurs during a transient period of hours following deposition, and includes an increase in grain size, changes in preferred crystallographic texture, and decreases in resistivity, hardness and compressive stress. As the grain size increases from the as-deposited value of 0.05–0.1 μm up to several μm, the decreasing grain boundary contribution to electron scattering lowers the resistivity by tens of percent to near-bulk values. Concurrently, as the volume of grain boundaries decreases, the stress is shown to change in the tensile direction by tens of MPa. The as-deposited grain size is also shown to be consistent with grain boundary pinning.


2018 ◽  
Vol 1054 ◽  
pp. 012024 ◽  
Author(s):  
T Omura ◽  
T Matsumoto ◽  
T Hatano ◽  
K Iida ◽  
H Ikuta

2010 ◽  
Vol 82 (2) ◽  
Author(s):  
G. Grimaldi ◽  
A. Leo ◽  
D. Zola ◽  
A. Nigro ◽  
S. Pace ◽  
...  

2004 ◽  
Vol 408-410 ◽  
pp. 568-570 ◽  
Author(s):  
H. Martı́nez ◽  
A. Mariño ◽  
J.E. Rodrı́guez

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