Biaxial stress dependence of the electrostimulated near-band-gap spectrum of GaN epitaxial film grown on (0001) sapphire substrate

2006 ◽  
Vol 88 (25) ◽  
pp. 251910 ◽  
Author(s):  
Keshu Wan ◽  
Alessandro Alan Porporati ◽  
Gan Feng ◽  
Hui Yang ◽  
Giuseppe Pezzotti
2010 ◽  
Vol 7 (7-8) ◽  
pp. 1906-1908 ◽  
Author(s):  
Yasuyuki Kobayashi ◽  
Chiun-Lung Tsai ◽  
Tetsuya Akasaka

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 698
Author(s):  
Wenwang Wei ◽  
Yi Peng ◽  
Jiabin Wang ◽  
Muhammad Farooq Saleem ◽  
Wen Wang ◽  
...  

AlN epilayers were grown on a 2-inch [0001] conventional flat sapphire substrate (CSS) and a nano-patterned sapphire substrate (NPSS) by metalorganic chemical vapor deposition. In this work, the effect of the substrate template and temperature on stress and optical properties of AlN films has been studied by using Raman spectroscopy, X-ray diffraction (XRD), transmission electron microscopy (TEM), UV-visible spectrophotometer and spectroscopic ellipsometry (SE). The AlN on NPSS exhibits lower compressive stress and strain values. The biaxial stress decreases from 1.59 to 0.60 GPa for AlN on CSS and from 0.90 to 0.38 GPa for AlN on NPSS sample in the temperature range 80–300 K, which shows compressive stress. According to the TEM data, the stress varies from tensile on the interface to compressive on the surface. It can be deduced that the nano-holes provide more channels for stress relaxation. Nano-patterning leads to a lower degree of disorder and stress/strain relaxes by the formation of the nano-hole structure between the interface of AlN epilayers and the substrate. The low crystal disorder and defects in the AlN on NPSS is confirmed by the small Urbach energy values. The variation in bandgap (Eg) and optical constants (n, k) with temperature are discussed in detail. Nano-patterning leads to poor light transmission due to light scattering, coupling, and trapping in nano-holes.


2016 ◽  
Vol 122 (11) ◽  
Author(s):  
Haibo Fan ◽  
Mingzi Wang ◽  
Zhou Yang ◽  
Xianpei Ren ◽  
Mingli Yin ◽  
...  

2001 ◽  
Vol 693 ◽  
Author(s):  
H. Y. Peng ◽  
M. D. McCluskey ◽  
Y. M. Gupta ◽  
M. Kneissl ◽  
N. M. Johnson

AbstractThe band-gap shift of GaN:Mg epilayers on (0001)-oriented sapphire was studied as a function of uniaxial strain compression along the c-axis using time-resolved, optical absorption measurements in shock wave experiments. For longitudinal stresses ranging from 4 to 14 GPa, the band gap shift is approximately 0.026 eV/GPa. Combining this result with the known behavior of wurtzite GaN under hydrostatic pressure and biaxial stress, a new set of deformation potentials has been estimated: acz-D1 = -10.2 eV, act-D2 = -7.9 eV, D3 = 1.33 eV and D4 = -0.74 eV. A slow band gap shift is also observed following the immediate band gap increase upon impact. This phenomenon can be explained by a time-dependent screening of the piezoelectric field.


2007 ◽  
Vol 300 (1) ◽  
pp. 194-198 ◽  
Author(s):  
J.J. Harris ◽  
R. Thomson ◽  
C. Taylor ◽  
D. Barlett ◽  
R.P. Campion ◽  
...  

2001 ◽  
Vol 222 (1-2) ◽  
pp. 96-103 ◽  
Author(s):  
H.Z. Xu ◽  
A. Bell ◽  
Z.G. Wang ◽  
Y. Okada ◽  
M. Kawabe ◽  
...  

2007 ◽  
Vol 994 ◽  
Author(s):  
Chihak Ahn ◽  
Scott T Dunham

AbstractWe studied stress effects on As activation in silicon using density functional theory. Based on lattice expansion coefficient, we calculated formation energy change due to applied stress and plotted the stress dependence of AsmV concentration. We found that biaxial stress results in minimal impact on As activation, which is consistent with experimental observation by Sugii et al. [J. Appl. Phys. 96, 261 (2004)], who found no significant change in As activation under tensile stress.


2002 ◽  
Vol 81 (4) ◽  
pp. 652-654 ◽  
Author(s):  
T. Onuma ◽  
S. F. Chichibu ◽  
T. Sota ◽  
K. Asai ◽  
S. Sumiya ◽  
...  

2005 ◽  
Vol 86 (11) ◽  
pp. 112111 ◽  
Author(s):  
Z. X. Mei ◽  
X. L. Du ◽  
Y. Wang ◽  
M. J. Ying ◽  
Z. Q. Zeng ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document