Comparison of crystallization kinetics in a-Si∕Cu and a-Si∕Al bilayer recording films under thermal annealing and pulsed laser irradiation
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2016 ◽
Vol 374
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pp. 138-142
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1983 ◽
Vol 44
(C5)
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pp. C5-449-C5-454
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Keyword(s):
1983 ◽
Vol 44
(C5)
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pp. C5-23-C5-36
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