scholarly journals Role of poly(styrene-acrylonitrile) copolymer interface layer in controlling charge storage and decay properties of amorphous selenium films

2006 ◽  
Vol 88 (21) ◽  
pp. 213506 ◽  
Author(s):  
S. Chand ◽  
G. D. Sharma ◽  
S. Dwivedi
1999 ◽  
Vol 75 (5) ◽  
pp. 621-623 ◽  
Author(s):  
Suresh Chand ◽  
G. D. Sharma ◽  
S. Dwivedi

Author(s):  
V. I. Mikla ◽  
I. P. Mikhalko ◽  
V. V. Mikla ◽  
Yu. Yu. Nagy

2015 ◽  
Vol 1088 ◽  
pp. 8-12
Author(s):  
Xin Long Ling ◽  
Ling Jiao Xie ◽  
Li Ming Zou ◽  
Yi Zhe Wei

MWCNTs were dispersed in acetone solution of styrene-acrylonitrile copolymer (SAN). Four factors which had effect on the average particle size, including the ratio of MWCNTs to SAN, the mass percent of MWCNTs, the ultrasonic power and the ultrasonic time, were studied. The optimal dispersion conditions of MWCNTs in acetone solution of SAN were the ratio of MWCNTs to SAN 1:3, the mass percent of MWCNTs 0.25%, the ultrasonic power 100%, and the ultrasonic time 30 min.


2015 ◽  
Vol 27 (4) ◽  
pp. 3281-3291 ◽  
Author(s):  
Mousa M. Abdul-Gader Jafar ◽  
Mahmoud H. Saleh ◽  
Mais Jamil A. Ahmad ◽  
Basim N. Bulos ◽  
Tariq M. Al-Daraghmeh

1991 ◽  
Vol 70 (9) ◽  
pp. 5122-5124 ◽  
Author(s):  
Suresh Chand ◽  
R. C. Bhatheja ◽  
G. D. Sharma ◽  
Subhas Chandra

2004 ◽  
Vol 811 ◽  
Author(s):  
Koji Kita ◽  
Masashi Sasagawa ◽  
Masahiro Toyama ◽  
Kentaro Kyuno ◽  
Akira Toriumi

ABSTRACTHfO2 films were deposited by reactive sputtering on Ge and Si substrates simultaneously, and we found not only the interface layer but the HfO2 film was thinner on Ge substrate compared with that on Si substrate. A metallic Hf layer has a crucial role for the thickness differences of both interface layer and HfO2 film, since those thickness differences were observed only when an ultrathin metallic Hf layer was predeposited before HfO2 film deposition. The role of metallic Hf is understandable by assuming a formation of volatile Hf-Ge-O ternary compounds at the early stage of film growth. These results show an advantage of HfO2/Ge over HfO2/Si systems from the viewpoint of further scaling of electrical equivalent thickness of the gate oxide films.


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