Electron beam ion source for highly charged ion production in a continuous regime

2006 ◽  
Vol 77 (3) ◽  
pp. 03A907
Author(s):  
G. Kuznetsov ◽  
M. Batazova
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Ion Production ◽  
Continuous Regime ◽  
Highly Charged Ion

Enhanced highly charged ion production using a metal-dielectric liner in the KVI 14 GHz ECR ion source

2002 ◽  
Vol 73 (2) ◽  
pp. 570-572 ◽  
Author(s):  
L. Schachter ◽  
S. Dobrescu ◽  
G. Rodrigues ◽  
A. G. Drentje
Keyword(s):  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Production ◽  
Highly Charged Ion

Review of highly charged ion production with ECR ion source and the future opportunities for HCI physics

2019 ◽  
Vol 49 (1) ◽  
pp. 47-53 ◽  
Author(s):  
L. Sun ◽  
H.W. Zhao ◽  
W. Lu ◽  
J.W. Guo ◽  
Y. Yang ◽  
...  
Keyword(s):  
Ion Source ◽  
Ecr Ion Source ◽  
The Future ◽  
Ion Production ◽  
Highly Charged Ion

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Mass analyzer using electron‐beam‐guiding type ion source

1979 ◽  
Vol 50 (12) ◽  
pp. 1517-1520 ◽  
Author(s):  
Tohru Kishi ◽  
Isao Yamada ◽  
Toshinori Takagi
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Mass Analyzer

Simulations of a Johann/Johansson diffraction spectrometer for x-ray experiments at an electron beam ion source

2013 ◽  
Vol T156 ◽  
pp. 014101 ◽  
Author(s):  
Ł Jabłoński ◽  
P Jagodziński ◽  
D Banaś ◽  
M Pajek
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
X Ray
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