Extraction of single-ion beams from helicon ion source in high plasma density operation mode: Experiment and simulation

2006 ◽  
Vol 77 (3) ◽  
pp. 03B901 ◽  
Author(s):  
S. Mordyk ◽  
V. Miroshnichenko ◽  
A. Nahornyy ◽  
D. Nahornyy ◽  
D. Shulha ◽  
...  
Keyword(s):  
Plasma Density ◽  
Operation Mode ◽  
High Plasma ◽  
Ion Beams ◽  
Ion Source ◽  
High Plasma Density ◽  
Experiment And Simulation

Effecting the condition of quasistationary thermonuclear burning in tokamaks with a high plasma density

1987 ◽  
Vol 63 (2) ◽  
pp. 661-664
Author(s):  
N. N. Vasil'ev ◽  
V. �. Lukash ◽  
M. N. Mariinskii ◽  
A. V. Nedospasov
Keyword(s):  
Plasma Density ◽  
High Plasma ◽  
Thermonuclear Burning ◽  
High Plasma Density

A conceptual fusion reactor based on the high-plasma-density Z-pinch

1977 ◽  
Vol 17 (5) ◽  
pp. 909-918 ◽  
Author(s):  
C.W. Hartman ◽  
G. Carlson ◽  
M. Hoffman ◽  
R. Werner ◽  
D.Y. Cheng
Keyword(s):  
Plasma Density ◽  
Fusion Reactor ◽  
High Plasma ◽  
High Plasma Density ◽  
Z Pinch

Characterization of Thin Film CdTe photovoltaic materials deposited by high plasma density magnetron sputtering

2011 ◽  
Vol 1323 ◽  
Author(s):  
A. Abbas ◽  
J.W. Bowers ◽  
B. Maniscalco ◽  
S. Moh ◽  
G.D West ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Plasma Density ◽  
Large Scale ◽  
Scale Up ◽  
High Plasma ◽  
Window Layer ◽  
Closed Field ◽  
Scale Production ◽  
Batch System ◽  
High Plasma Density

ABSTRACTA new magnetron sputtering strategy is introduced that utilizes high plasma density (~5mA.cm-2) to avoid or reduce high temperature processing. The technique uses magnetrons of opposing magnetic polarity to create a “closed field” in which the plasma density is enhanced without the need for high applied Voltages. A batch system has been used which employs a rotating vertical drum as the substrate carrier and a symmetrical array of linear magnetrons. The magnetrons are fitted with target materials for each of the thin films required in the photovoltaic (PV) stack including the CdTe absorber layer, CdS window layer, metal contact using the conventional superstrate configuration. The “closed field” sputtering technology allows scale up not only for larger batch system designs but it is also configurable for “in-line” or “roll to roll” formats for large scale production. The morphology of each of the layers is characterized using a variety of structural and optical techniques including Field Emission Gun SEM and X-ray diffraction (XRD).

Dynamic Temperature Profiles of Plasma Neutralization Induced by Microwave Irradiation

2013 ◽  
Vol 849 ◽  
pp. 405-410
Author(s):  
Wen Teng Chang ◽  
Yi Liang
Keyword(s):  
Microwave Irradiation ◽  
Plasma Density ◽  
Room Temperature ◽  
Local Heating ◽  
High Plasma ◽  
Acute Angle ◽  
Thermal Dissipation ◽  
High Plasma Density ◽  
Higher Temperature ◽  
Infrared Thermal Images

This paper investigates the thermal profiles of plasma neutralization induced by microwave radiation by the chronological examination of their thermal distributions. Single triangular, circular, and bowtie-shaped copper tapes were trimmed to investigate the plasma neutralization burst under microwave irradiation. The infrared thermal images showed that the copper tape with a more acute angle and with a narrower gap between the bowtie-shaped electrodes was inclined to generate high plasma density. A high plasma-density area was eventually observed, generating a higher temperature peak based on the experimental results. Thermal dissipation under room temperature was found critical in determining peak temperature after burst. These results may provide basis for the development of an inexpensive, microwave-induced local heating.

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