Optical emission spectroscopy of a RF plasma for laboratory simulation of Titan’s aerosols

2005 ◽  
Author(s):  
G. Cernogora
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Laboratory Simulation ◽  
Rf Plasma

Optical Emission Spectroscopy Measurement of Ar\H2\CH4 RF Plasma for Nano-Crystal Diamond Film Deposition

2014 ◽  
Vol 1035 ◽  
pp. 373-378 ◽  
Author(s):  
Yan Chao Shi ◽  
Qin Jian Zhang ◽  
Jia Jun Li ◽  
Guang Chao Chen
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Diamond Films ◽  
Optical Emission ◽  
Film Deposition ◽  
Rf Plasma ◽  
Gas Mixture ◽  
Technical Application ◽  
Plasma Enhanced Cvd ◽  
Nano Crystal

Ar\H2\CH4 gas mixture was utilized to grow nanocrystal diamond films in a RF plasma enhanced CVD system. CH4\ H2 ratios were changed to study the effect of plasma radicals on the deposit, in which optical emission spectroscopy (OES) was applied to analyze the plasma radicals. It was found that Hα, Hβ, Hγ, CH, C2 were the main radicals in the plasma. Among them, the CH intensity of OES was usually quite strong and increased sharply when the ratio of CH4/H2 was greater than 3%. The intensity of C2 was weak and basically unchanged with the addition of methane. This study can provide a new possible technical application for depositing NCD films.

A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl3 and Cl2 Plasmas

1987 ◽  
Vol 98 ◽  
Author(s):  
J. A. Cairns ◽  
R. Smailes ◽  
D. C. W. Blaikley ◽  
P. M. Banks ◽  
G. Hancock ◽  
...  
Keyword(s):  
Steady State ◽  
Plasma Etching ◽  
Ground State ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Discharge ◽  
Rf Plasma ◽  
Rf Plasma Discharge ◽  
State Models

ABSTRACTOptical Emission Spectroscopy (OES) with argon actinometry has been used to study the influence of machine parameters on the composition of a BCl3 RF plasma discharge in the absence and presence of aluminium. Two steady state models are proposed to account for the appearance of the various species seen, and to explain their relative abundances in response to changes in power and pressure. The validity of the actinometric technique for measuring relative changes in ground state concentrations is discussed also.

scholarly journals Modeling and Measurement of Submicron Particles in RF Plasmas in Ar

1995 ◽  
Vol 48 (3) ◽  
pp. 439
Author(s):  
Y Hosokauia ◽  
T Kitajima ◽  
T Makabe
Keyword(s):  
Emission Spectroscopy ◽  
Continuum Model ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Particle Growth ◽  
Mie Scattering ◽  
Submicron Particles ◽  
Rf Plasma ◽  
Plasma System ◽  
Rf Plasmas

The work is focused on the growth and transport of submicron particles in nonreactive radiofrequency plasma in Ar at 13�56 MHz, studied by numerical modeling using the relaxation continuum model, and by experiment using spatiotemporally resolved optical emission spectroscopy with Mie scattering. The particle growth/decay under conditions of the initially injected (CF2)n, and the related spatiotemporal change of the rf plasma structure, are discussed in terms of their numerical and experimental results. The results give suggestions with respect to the influence of particles in a dusty rf plasma system, such as dry etching and sputtering.

Space Resolved Optical Emission Spectroscopy During Deposition of BaxSr1-xTiO3 Thin Films by Double Hollow Cathode Plasma Jet System

2009 ◽  
Vol 609 ◽  
pp. 105-109
Author(s):  
J. Olejníček ◽  
Zdenek Hubička ◽  
M. Čada ◽  
P. Virostko ◽  
Štepan Kment ◽  
...  
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Jet ◽  
Optical Measurements ◽  
Rf Plasma ◽  
Oh Radicals ◽  
Cathode Plasma

Pulse modulated double hollow cathode RF plasma jet system with two separate independent nozzles made of BaTiO3 (BTO) and SrTiO3 (STO) was used for deposition of BSTO thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Dielectric properties of BSTO layers strongly depend on ratio composition expressed by parameter x = Ba/(Ba+Sr) and on accuracy in presence of other elements. Space resolved optical emission spectroscopy (OES) was used mainly for monitoring of concentration of particles sputtered from the hollow cathode and for feedback correction of power supplied in both nozzles because applied power was responsible for sputtering speed of Ba and Sr particles. Main attention was focused on relation between ratio of spectral intensity of Ba, Ba+, Sr and Sr+ lines close to substrate and ratio of Ba and Sr concentration in the deposited film. 2D map of emission lines intensity distribution for Ba, Ba+, Sr, Sr+, Ti, Ar, and Ar+ for double hollow cathode plasma jet system with BTO and STO nozzles was created. OES was also used for observing of excess of Ti particles in final layer with negative effect on layer properties and for measurement of rotational temperature of OH radicals. Preliminary results of all these optical measurements are published in this paper. Deposited thin films were analyzed by X-ray diffraction, which confirmed presence of BSTO and STO perovskite phase in the films, by atomic force microscopy (AFM), by electron microprobe and by micro-Raman scattering measurement.

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