Electron-hole dynamics in GaN under short-pulse laser excitation

2005 ◽  
Author(s):  
Yang Wang
Keyword(s):  
Pulse Laser ◽  
Laser Excitation ◽  
Short Pulse ◽  
Electron Hole ◽  
Short Pulse Laser ◽  
Pulse Laser Excitation

Modeling short-pulse laser excitation of dielectric materials

2014 ◽  
Vol 117 (1) ◽  
pp. 7-12 ◽  
Author(s):  
K. Wædegaard ◽  
D. B. Sandkamm ◽  
L. Haahr-Lillevang ◽  
K. G. Bay ◽  
Peter Balling
Keyword(s):  
Pulse Laser ◽  
Laser Excitation ◽  
Short Pulse ◽  
Dielectric Materials ◽  
Short Pulse Laser ◽  
Pulse Laser Excitation

Short-pulse laser excitation of quartz: experiments and modelling of transient optical properties and ablation

2015 ◽  
Vol 120 (4) ◽  
pp. 1221-1227 ◽  
Author(s):  
L. Haahr-Lillevang ◽  
K. Wædegaard ◽  
D. B. Sandkamm ◽  
A. Mouskeftaras ◽  
S. Guizard ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulse Laser ◽  
Laser Excitation ◽  
Short Pulse ◽  
Short Pulse Laser ◽  
Pulse Laser Excitation

Simulation of Crystallization Processes in Phase Change Optical Discs

2003 ◽  
Vol 803 ◽  
Author(s):  
Bérangère Hyot ◽  
Ludovic Poupinet ◽  
Pierre Desré
Keyword(s):  
Phase Change ◽  
Laser Excitation ◽  
Short Pulse ◽  
Amorphous State ◽  
Change Model ◽  
Short Pulse Laser ◽  
New Material ◽  
Pulse Laser Excitation ◽  
Optical Discs ◽  
Chemical Influence

ABSTRACTFuture development of erasable phase change recording requires a thorough understanding of the fundamental mechanisms involved in crystallization processes to be able to forecast the behavior of a new material or to guide its optimization when submitted to specific conditions. In this paper, we emphasize that a predictive simulation is valuable only if a good modeling and accurate values of the involved parameters are used. We will present the main characteristics of our phase change model (effect of the short-pulse laser excitation, chemical influence of the materials in contact with the PC layer, stabilization of the amorphous state for very thin film layers) and we will discuss experimental and simulated crystallization behaviors.

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

Chromium oxide dissolution in steels via short pulse laser processing

2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov
Keyword(s):  
Pulse Laser ◽  
Chromium Oxide ◽  
Laser Processing ◽  
Short Pulse ◽  
Oxide Dissolution ◽  
Short Pulse Laser
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