Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition

2005 ◽  
Vol 98 (2) ◽  
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F. K. Shan ◽  
G. X. Liu ◽  
W. J. Lee ◽  
G. H. Lee ◽  
I. S. Kim ◽  
...  
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Glenn D. Boreman ◽  
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Tino Hofmann

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...  

Lowest temperature to date for the ALD growth of Ga2O3 thin films and the 2nd highest GPC regarding Ga2O3 ALD.


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