Molecular-dynamics model of energetic fluorocarbon-ion bombardment on SiO2. II. CFx+ (x=1, 2, 3) ion etch characterization
1994 ◽
Vol 50
(15)
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pp. 11167-11174
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2003 ◽
Vol 83
(4)
◽
pp. 253-273
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Keyword(s):