Lightly phosphorus-doped homoepitaxial diamond films grown by chemical vapor deposition

Masayuki Katagiri; Junichi Isoya; Satoshi Koizumi; Hisao Kanda

doi:10.1063/1.1840119

Lightly phosphorus-doped homoepitaxial diamond films grown by chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1840119 ◽

2004 ◽

Vol 85 (26) ◽

pp. 6365-6367 ◽

Cited By ~ 109

Author(s):

Masayuki Katagiri ◽

Junichi Isoya ◽

Satoshi Koizumi ◽

Hisao Kanda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Phosphorus Doped

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Substrate temperature optimization for heavily-phosphorus-doped diamond films grown on vicinal (001) surfaces using high-power-density microwave-plasma chemical-vapor-deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2015.04.037 ◽

2015 ◽

Vol 424 ◽

pp. 33-37 ◽

Cited By ~ 5

Author(s):

Osamu Maida ◽

Shuhei Tada ◽

Haruki Nishio ◽

Toshimichi Ito

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

High Power Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Temperature Optimization ◽

Phosphorus Doped

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Electron paramagnetic resonance study of phosphorus-doped n-type homoepitaxial diamond films grown by chemical vapor deposition

physica status solidi (a) ◽

10.1002/pssa.200671409 ◽

2006 ◽

Vol 203 (13) ◽

pp. 3367-3374 ◽

Cited By ~ 6

Author(s):

M. Katagiri ◽

J. Isoya ◽

S. Koizumi ◽

H. Kanda

Keyword(s):

Electron Paramagnetic Resonance ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electron Paramagnetic Resonance Study ◽

Diamond Films ◽

Chemical Vapor ◽

Paramagnetic Resonance ◽

Phosphorus Doped ◽

Electron Paramagnetic

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Electron Paramagnetic Resonance Study of Phosphorus-Doped n-Type Homoepitaxial Diamond Films Grown by Chemical Vapor Deposition

ChemInform ◽

10.1002/chin.200719201 ◽

2007 ◽

Vol 38 (19) ◽

Author(s):

M. Katagiri ◽

J. Isoya ◽

S. Koizumi ◽

H. Kanda

Keyword(s):

Electron Paramagnetic Resonance ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electron Paramagnetic Resonance Study ◽

Diamond Films ◽

Chemical Vapor ◽

Paramagnetic Resonance ◽

Phosphorus Doped ◽

Electron Paramagnetic

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Field emission properties of phosphorus doped microwave plasma chemical vapor deposition diamond films by ion implantation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1531170 ◽

2003 ◽

Vol 21 (1) ◽

pp. 603 ◽

Cited By ~ 1

Author(s):

Euo Sik Cho ◽

Byung-Gook Park ◽

Jong Duk Lee ◽

Sang Jik Kwon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties ◽

Phosphorus Doped

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Phonon-assisted electronic transitions in phosphorus-doped n-type chemical vapor deposition diamond films

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00511-2 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 439-443 ◽

Cited By ~ 22

Author(s):

K Haenen ◽

K Meykens ◽

M Nesládek ◽

G Knuyt ◽

L.M Stals ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Electronic Transitions ◽

Chemical Vapor Deposition Diamond ◽

Phosphorus Doped

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Morphology and semiconducting properties of homoepitaxially grown phosphorus-doped (100) and (111) diamond films by microwave plasma-assisted chemical vapor deposition using triethylphosphine as a dopant source

Journal of Crystal Growth ◽

10.1016/s0022-0248(98)00360-1 ◽

1998 ◽

Vol 191 (4) ◽

pp. 723-733 ◽

Cited By ~ 6

Author(s):

Takeyasu Saito ◽

Masanori Kameta ◽

Katsuki Kusakabe ◽

Shigeharu Morooka ◽

Hideaki Maeda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Semiconducting Properties ◽

Phosphorus Doped ◽

Dopant Source

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Influence of Boron Doping on Growth Characteristic of Diamond Films Prepared by Hot Cathode DC Chemical Vapor Deposition

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2009.00607 ◽

2009 ◽

Vol 24 (3) ◽

pp. 607-611 ◽

Cited By ~ 3

Author(s):

Jiang-Wei LV ◽

Yu-Jie FENG ◽

Hong-Yan PENG ◽

Yu-Qiang CHEN

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Growth Characteristic ◽

Diamond Films ◽

Chemical Vapor ◽

Boron Doping

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In Situ Phosphorus-Doped Poly-Si by Low Pressure Chemical Vapor Deposition for Passivating Contacts

2020 47th IEEE Photovoltaic Specialists Conference (PVSC) ◽

10.1109/pvsc45281.2020.9300543 ◽

2020 ◽

Author(s):

Meric Firat ◽

Hariharsudan Sivaramakrishnan Radhakrishnan ◽

Maria Recaman Payo ◽

Filip Duerinckx ◽

Rajiv Sharma ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Phosphorus Doped

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Intrinsic stress evolution in diamond films prepared in a CH4H2NH3 hot filament chemical vapor deposition system

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00265-x ◽

2000 ◽

Vol 9 (7) ◽

pp. 1388-1392 ◽

Cited By ~ 14

Author(s):

N.G Shang ◽

C.S Lee ◽

Z.D Lin ◽

I Bello ◽

S.T Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Intrinsic Stress ◽

Stress Evolution ◽

Hot Filament

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Doping gas effects on plasma enhanced chemical vapor deposition on heavily phosphorus-doped n+silicon film

Applied Physics Letters ◽

10.1063/1.120146 ◽

1997 ◽

Vol 71 (19) ◽

pp. 2821-2823 ◽

Cited By ~ 7

Author(s):

Yue Kuo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Phosphorus Doped

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