Atomic layer deposition of lanthanum aluminum oxide nano-laminates for electrical applications

2004 ◽  
Vol 84 (20) ◽  
pp. 3957-3959 ◽  
Author(s):  
Booyong S. Lim ◽  
Antti Rahtu ◽  
Philippe de Rouffignac ◽  
Roy G. Gordon
2006 ◽  
Vol 12 (2-3) ◽  
pp. 158-164 ◽  
Author(s):  
K. Kukli ◽  
M. Ritala ◽  
V. Pore ◽  
M. Leskelä ◽  
T. Sajavaara ◽  
...  

Author(s):  
Sungho Park ◽  
Byung Jun Kim ◽  
Tae Yeon Kim ◽  
Eui Young Jung ◽  
Kyu-Myung Lee ◽  
...  

We have developed a visible-light phototransistor with excellent photodetection characteristics and stability via atomic layer deposition (ALD) to add a thin layer of aluminum oxide (Al2O3) to quantum dot (QD)/zinc oxide (ZnO) films.


2010 ◽  
Vol 20 (18) ◽  
pp. 3099-3105 ◽  
Author(s):  
David J. Comstock ◽  
Steven T. Christensen ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin ◽  
Mark C. Hersam

2012 ◽  
Vol 30 (1) ◽  
pp. 01A127 ◽  
Author(s):  
Annelies Delabie ◽  
Sonja Sioncke ◽  
Jens Rip ◽  
Sven Van Elshocht ◽  
Geoffrey Pourtois ◽  
...  

2011 ◽  
Vol 110 (12) ◽  
pp. 123514 ◽  
Author(s):  
N. Biluš Abaffy ◽  
D. G. McCulloch ◽  
J. G. Partridge ◽  
P. J. Evans ◽  
G. Triani

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