Fast Vacuum‐uv Light Source for Gas Phase Flash Photolysis

1967 ◽  
Vol 38 (12) ◽  
pp. 1728-1730 ◽  
Author(s):  
K. H. Welge ◽  
J. Wanner ◽  
F. Stuhl ◽  
A. Heindrichs
Keyword(s):  
Gas Phase ◽  
Light Source ◽  
Flash Photolysis ◽  
Uv Light ◽  
Vacuum Uv

scholarly journals Development of 146nm Vacuum UV Light Source

2012 ◽  
Vol 32 ◽  
pp. 477-481 ◽  
Author(s):  
Bu Ren’an ◽  
Song Mingdong ◽  
Wang Zhongrui ◽  
Jin Jing ◽  
Hu Wenbo ◽  
...  
Keyword(s):  
Light Source ◽  
Uv Light ◽  
Vacuum Uv

A kinetic study of the reactions of OH radicals with fluoroethanes. Estimates of C—H bond strengths in fluoroalkanes

1983 ◽  
Vol 61 (5) ◽  
pp. 861-865 ◽  
Author(s):  
Jean-Pierre Martin ◽  
George Paraskevopoulos
Keyword(s):  
Kinetic Study ◽  
Gas Phase ◽  
Rate Constants ◽  
Flash Photolysis ◽  
Oh Radicals ◽  
Bond Dissociation Energies ◽  
Time Resolved ◽  
Dissociation Energies ◽  
Bond Strengths ◽  
Vacuum Uv

A kinetic study of the reactions of OH radicals with a series of fluoroethanes in the gas phase is presented. OH radicals were generated by flash photolysis of H2O vapor in the vacuum uv (λ > 165 nm) and were monitored in absorption by time-resolved attenuation of resonance radiation at 308.15 nm [OH(A2Σ+ → X2Π)]. The following absolute rate constants (in units of 109 cm3mol−1 s−1 at the 95% confidence limit) were determined at [Formula: see text][Formula: see text][Formula: see text][Formula: see text][Formula: see text]From a linear correlation of the present and previously published rate constants with bond dissociation energies, the following quantities (in kcal mol−1 at 298 K) were estimated to be: D(CH3CHF—H) = 96.3 ± 1.5, D(CH2FCHF—H = 98.8 ± 1.0, D(CF3CHF—H) = 103.5 ± 1.0, D(CHF2CF2—H) = 103.0 ± 1.5, and [Formula: see text][Formula: see text]

Development of a UV Light Source using Pr:LuAG Thin Film Target Pumped by Electron Beam

2015 ◽  
Vol 135 (9) ◽  
pp. 1049-1054
Author(s):  
Norio Ichikawa ◽  
Kohei Ikeda ◽  
Yoshinori Honda ◽  
Hiroyuki Taketomi ◽  
Koji Kawai ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Light Source ◽  
Uv Light

A Large Emitting Area UV Light Source With Semiconductor Cathode

2004 ◽  
Vol 32 (5) ◽  
pp. 2093-2098 ◽  
Author(s):  
B.G. Salamov ◽  
Y. OztekinCiftci ◽  
K. Colakoglu
Keyword(s):  
Light Source ◽  
Uv Light

Mechanical Characterization of UV Photopolymerized PMMA with Different Photo-Initiator Concentration

2021 ◽  
Vol 903 ◽  
pp. 11-16
Author(s):  
M.A. Manjunath ◽  
K. Naveen ◽  
Prakash Vinod ◽  
N. Balashanmugam ◽  
M.R. Shankar
Keyword(s):  
Mechanical Properties ◽  
Light Source ◽  
Polymethyl Methacrylate ◽  
Biomedical Applications ◽  
Mechanical Characterization ◽  
Uv Light ◽  
Curing Time ◽  
Uv Led ◽  
Pmma Resin

Polymethyl methacrylate (PMMA) is one among few known photo-polymeric resin useful in lithography for fabricating structures having better mechanical properties to meet the requirement in electronics and biomedical applications. This study explores the effect of Photo Initiator (PI) concentration and also curing time on strength and hardness of Polymethyl methacrylate (PMMA) obtained by UV photopolymerization of Methyl methacrylate (MMA) monomer. The UV LED light source operating at the wavelength of 364 nm is used with Benzoin Ethyl Ether (BEE) as photo initiator. The curing of PMMA resin is supported with peltier cooling device placed at the bottom of the UV light source. The characterisation study of UV photo cured PMMA is analysed through nano indenter (Agilent Technologies-G200). The current work investigates the influence of PI concentration and curing time in achieving maximum mechanical properties for UV photopolymerized PMMA.

Improved miniature long-lived uv light source

1976 ◽  
Vol 15 (12) ◽  
pp. 2968
Author(s):  
S. F. Somerstein
Keyword(s):  
Light Source ◽  
Uv Light

Simultaneous photochemical generation of ozone in the gas phase and photolysis of aqueous reaction systems using one VUV light source

1997 ◽  
Vol 35 (4) ◽  
pp. 41-48 ◽  
Author(s):  
T.M. Hashem ◽  
M. Zirlewagen ◽  
A. M. Braun
Keyword(s):  
Gas Phase ◽  
Light Source ◽  
Organic Pollutants ◽  
Vacuum Ultraviolet ◽  
Oxidative Degradation ◽  
Reaction System ◽  
Photochemical Reactions ◽  
Experimental Conditions ◽  
Photochemical Generation ◽  
Kinetics Of

A more efficient use of vacuum ultraviolet (VUV) radiation produced by an immersed Xe-excimer light source (172 nm) was investigated for the oxidative degradation of organic pollutants in aqueous systems. All emitted VUV radiation from one light source was used in two simultaneous but separate photochemical reactions: (1) photochemical generation of ozone by irradiating oxygen in the gas phase and (2) photolysis of the aqueous reaction system. The gas stream containing the generated ozone is sparged into the reaction system, thus enhancing the oxidative degradation of organic pollutants. The photochemically generated ozone in the gas phase was quantitatively analyzed, and the kinetics of the degradation of 4-chlorophenol (4-CP) and of the dissolved organic carbon (DOC) were determined under different experimental conditions. The results show that the rates of degradation of the substrate and of the DOC decrease in the order of the applied processes, VUV/O3 > O3 > VUV.

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