Evidence of nitric-oxide-induced surface band bending of indium tin oxide

2004 ◽  
Vol 95 (11) ◽  
pp. 6273-6276 ◽  
Author(s):  
Jianqiao Hu ◽  
Jisheng Pan ◽  
Furong Zhu ◽  
Hao Gong
Keyword(s):  
Nitric Oxide ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Surface Band ◽  
Band Bending

Surface Electronic Structure of Nitric-oxide-treated Indium Tin Oxide

2003 ◽  
Vol 796 ◽  
Author(s):  
Hu Jianqiao ◽  
Pan Jisheng ◽  
Furong Zhu ◽  
Gong Hao
Keyword(s):  
Nitric Oxide ◽  
Binding Energy ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Surface Region ◽  
Valence Band Maximum ◽  
Surface Band ◽  
Band Bending ◽  
Surface Electronic Structure

ABSTRACTThe surface electronic properties of the nitric oxide (NO) treated indium tin oxide (ITO) are examined in-situ by a four-point probe and X-ray photoelectron spectroscopy (XPS). The XPS N1s peak emerged at a high binding energy of 404 eV indicating that NO is reactive with ITO. NO adsorption induces an increase of film sheet resistance, arising from an oxygen rich layer near the ITO surface region, with approximately 2.5 nm thick. This implies that the interaction of NO with ITO is occurred around surface region. Valence band maximum measured for NO-absorbed ITO was shifted to the low binding energy side. This is related to the upward surface band bending.

An angular dependent X-ray photoemission study of Indium-tin-oxide surfaces

2002 ◽  
Vol 747 ◽  
Author(s):  
H. H. Fong ◽  
W. J. Song ◽  
S. K. So
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Surface Band ◽  
Band Bending ◽  
X Ray ◽  
Plasma Treatments ◽  
Photoemission Study ◽  
Uv Ozone

ABSTRACTThe surface properties of indium-tin-oxide (ITO) thin films treated by UV ozone or plasma were analyzed by angular dependent X-ray photoelectron spectroscopy (ADXPS) and by ultraviolet photoemission (UPS). The chemical composition, chemical states and the work function of the ITO surfaces were deduced. Our analysis indicate that ITO surface is Sn-rich. Both UV ozone and O-plasma treatments are most effective in removing surface hydrocarbon. Among all treatments, O-plasma treated surface achieved the highest work function of 4.4eV, whereas argon ion sputtered surface had the lowest work function of 3.9eV. Both O-plasma and UV ozone treatments increase the surface oxygen concentration. It is proposed that O2-ions diffuse into ITO. The diffusion length is about 50Å as deduced from ADXPS. The stoichiometry of the surface is the major factor in controlling the surface work function of ITO. A surface band bending model is proposed to account for the change of work function due to “oxidized” ITO surface after UV-ozone or oxygen plasma treatments.

The effect of molybdenum trioxide inter-layer between indium tin oxide (ITO) and organic semiconductor on the energy level alignment

2009 ◽  
Vol 1212 ◽  
Author(s):  
Irfan Irfan ◽  
Huanjun Ding ◽  
Yongli Gao ◽  
Do Yang Kim ◽  
Jegadesan Subbiah ◽  
...  
Keyword(s):  
Energy Level ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Molybdenum Trioxide ◽  
Ultra Violet ◽  
Photoemission Spectroscopy ◽  
Layer By Layer ◽  
Band Bending ◽  
Energy Level Alignment ◽  
In Series

AbstractWe investigated 0 to 300 Å thick stepped molybdenum trioxide (MoO3) inter-layer between in-situ oxygen plasma treated conducting indium tin oxide (ITO) and chloro-aluminum pthalocyanine (AlPc-Cl) layer-by-layer evaporated up to 228 Å, with ultra-violet photoemission spectroscopy (UPS) and inverse photoemission spectroscopy (IPES). The MoO3 inter-layers were observed to increase the surface workfunction. The workfunction increase was observed to saturate at 20 Å of MoO3 coverage. The increased surface workfunction causes hole accumulation and band bending in the subsequently deposited AlPc-Cl. A possible explanation of reduction in series resistance by the insertion of the MoO3 insulating layer is discussed based on these observations and energy level alignment.

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