Ionic Conductivity, Dielectric Constant, and Optical Properties of Anodic Oxide Films on Two Types of Sputtered Tantalum Films

1966 ◽  
Vol 37 (4) ◽  
pp. 1821-1824 ◽  
Author(s):  
D. Mills ◽  
L. Young ◽  
F. G. R. Zobel
Keyword(s):  
Dielectric Constant ◽  
Optical Properties ◽  
Ionic Conductivity ◽  
Oxide Films ◽  
Anodic Oxide ◽  
Anodic Oxide Films ◽  
Tantalum Films

ANODIC OXIDE FILMS ON INDIUM ANTIMONIDE

1966 ◽  
Vol 44 (6) ◽  
pp. 641-646 ◽  
Author(s):  
A. C. Harkness ◽  
L. Young
Keyword(s):  
Optical Properties ◽  
Indium Antimonide ◽  
Oxide Films ◽  
Anodic Oxide ◽  
Crystal Face ◽  
Anodic Oxide Films ◽  
Breakdown Region ◽  
Kinetics Of Formation ◽  
Kinetics Of ◽  
Transition Voltage

The kinetics of formation of anodic oxide films on different crystal faces of single crystal indium antimonide have been investigated by measurements of charge passed, capacitance, and optical properties. Below a transition or breakdown region of voltage no difference in kinetics was found. Above this voltage a marked difference appeared. The transition voltage was found to depend on both the crystal face and the current density at which the film was formed.

Electrochemical and Optical Properties of Anodic Oxide Films on Titanium

1989 ◽  
Vol 136 (8) ◽  
pp. 2178-2184 ◽  
Author(s):  
J. L. Ord ◽  
D. J. De Smet ◽  
D. J. Beckstead
Keyword(s):  
Optical Properties ◽  
Oxide Films ◽  
Anodic Oxide ◽  
Anodic Oxide Films

The determination of the thickness, dielectric constant, and other properties of anodic oxide films on tantalum from the interference colours

1958 ◽  
Vol 244 (1236) ◽  
pp. 41-53 ◽  
Keyword(s):  
Dielectric Constant ◽  
Refractive Index ◽  
Oxide Films ◽  
Anodic Oxide ◽  
Effective Dielectric Constant ◽  
Immersion Method ◽  
Anodic Oxide Films ◽  
A Value ◽  
Specular Reflectivity

The thickness of anodic oxide films on chemically polished tantalum was determined from the wavelengths of the minima in the specular reflectivity using a value of the refractive index of 2·20±0·02 at 5900 Ǻ which was measured on detached flakes of the oxide by the immersion method. An auxiliary measure of increments of thickness was required for the analysis of the spectrophotometric measurements. This was provided by the quantity ( Q ∆( 1/ C )) ½ , where Q was the charge which was required to form the increment of thickness, and ∆(1/ C ) was the corresponding increase in the reciprocal capacity. This measure of thickness, like that provided by the colours, is independent of the area. The analysis gives the refractive index between 2800 and 6000 Ǻ, the net phase change in the two reflexions (with certain assumptions), and a value of ϵ/ρ, where ϵ is the effective dielectric constant under the conditions used, and ρ is the density, ρ was determined by weighing specimens in air and water. The value obtained was 7·93 ± 3%, which gives ϵ = 27·6±5%, at 1 kc/s. The effective surface area was then calculated, and was found to be very little different from the apparent area. The field strength during the formation of oxide at 9·55 mA/cm 2 and 25·8° C was found to be 6·61 x 10 6 V/cm and to be constant within experimental error, independent of thickness.

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