Correction of eddy current errors in electron beam deflection

1973 ◽  
Vol 44 (8) ◽  
pp. 3766-3769 ◽  
Author(s):  
G. A. Wardly
1981 ◽  
Vol 64 (2) ◽  
pp. 101-107
Author(s):  
Yoshifusa Wada ◽  
Masatoshi Migitaka ◽  
Yasuhide Hisamoto ◽  
Koichiro Mizukami

1993 ◽  
Vol 63 (5) ◽  
pp. 645-647 ◽  
Author(s):  
G. Y. Chang ◽  
R. B. Givens ◽  
J. W. M. Spicer ◽  
R. Osiander ◽  
J. C. Murphy

2018 ◽  
Vol 143 ◽  
pp. 03006 ◽  
Author(s):  
Aleksey Zenin ◽  
Aleksandr Klimov ◽  
Ilya Bakeev

The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.


2020 ◽  
Vol 211 ◽  
pp. 112925
Author(s):  
Lixin Zhang ◽  
Mathijs W.H. Garming ◽  
Jacob P. Hoogenboom ◽  
Pieter Kruit

1983 ◽  
Vol 51 (6) ◽  
pp. 572-573
Author(s):  
J. Fukai ◽  
G. D. Thaxton ◽  
E. T. Kinzer

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