Properties of Inductively Excited Ar+ Ion Lasers in High‐Current Regions

1968 ◽  
Vol 39 (13) ◽  
pp. 5998-6003 ◽  
Author(s):  
Shuzo Hattori ◽  
Toshio Goto
Keyword(s):  
High Current ◽  
Ion Lasers

Precautions required when using a continuous gas flow in high-current ion lasers

1967 ◽  
Vol 3 (4) ◽  
pp. 169-170 ◽  
Author(s):  
B. See ◽  
W. Garwoli ◽  
J. Hughes
Keyword(s):  
Gas Flow ◽  
High Current ◽  
Ion Lasers

Output power saturation in high current regions of different noble-gas ion lasers

1974 ◽  
Vol 5 (3) ◽  
pp. 203-210 ◽  
Author(s):  
J. Boscher ◽  
R. Finzel ◽  
J. Salk ◽  
G. Schäfer
Keyword(s):  
Output Power ◽  
Noble Gas ◽  
High Current ◽  
Ion Lasers ◽  
Output Power Saturation

ION LASER THEORY

1996 ◽  
Vol 10 (18n19) ◽  
pp. 2405-2422
Author(s):  
D. SHAPIRO
Keyword(s):  
Single Frequency ◽  
High Current ◽  
Temperature Plasma ◽  
Laser Theory ◽  
Physical Problems ◽  
Ion Lasers ◽  
Ion Laser ◽  
Frequency Laser ◽  
Ionic Scattering

Ion lasers, especially argon, are the most powerful sources of visible and near UV continuous coherent radiation. The active medium of lasers is low-temperature plasma. They are familiar to scientists and engineers from the 70’s. However, a series of physical effects remained unclear and there was a barrier to enhancing the power and improving the quality of the output radiation. The theory of ion lasers is developed at the interface between plasma physics and quantum optics. This paper covers the solution of some of these physical problems, particularly, the high-current regime of gas discharge and the quantum kinetics of ionic collisions. The high-current multi-component discharge is important for intense generation in the ultraviolet spectrum. The ionic scattering leads to the Lamb dip broadening in the single-frequency laser and increases its output.

Spatial resolution of X-ray microanalysis in thin foils

1978 ◽  
Vol 36 (1) ◽  
pp. 544-545
Author(s):  
R. Hutchings ◽  
I.P. Jones ◽  
M.H. Loretto ◽  
R.E. Smallman
Keyword(s):  
Spatial Resolution ◽  
Electron Probe ◽  
Beam Divergence ◽  
Inelastic Interaction ◽  
Specimen Thickness ◽  
High Current ◽  
Beam Spreading ◽  
X Ray ◽  
Thin Foils ◽  
Complex Calculation

There is increasing interest in X-ray microanalysis of thin specimens and the present paper attempts to define some of the factors which govern the spatial resolution of this type of microanalysis. One of these factors is the spreading of the electron probe as it is transmitted through the specimen. There will always be some beam-spreading with small electron probes, because of the inevitable beam divergence associated with small, high current probes; a lower limit to the spatial resolution is thus 2αst where 2αs is the beam divergence and t the specimen thickness.In addition there will of course be beam spreading caused by elastic and inelastic interaction between the electron beam and the specimen. The angle through which electrons are scattered by the various scattering processes can vary from zero to 180° and it is clearly a very complex calculation to determine the effective size of the beam as it propagates through the specimen.

Precipitation in silicon: Microanalysis

1988 ◽  
Vol 46 ◽  
pp. 474-475
Author(s):  
R.W. Carpenter
Keyword(s):  
Transition Metals ◽  
Spatial Resolution ◽  
Thin Foil ◽  
Precipitation Reaction ◽  
High Current ◽  
Reaction Products ◽  
Carbon And Nitrogen ◽  
Dielectric Layers ◽  
Precipitation Processes ◽  
Areas Of Interest

Interest in precipitation processes in silicon appears to be centered on transition metals (for intrinsic and extrinsic gettering), and oxygen and carbon in thermally aged materials, and on oxygen, carbon, and nitrogen in ion implanted materials to form buried dielectric layers. A steadily increasing number of applications of microanalysis to these problems are appearing. but still far less than the number of imaging/diffraction investigations. Microanalysis applications appear to be paced by instrumentation development. The precipitation reaction products are small and the presence of carbon is often an important consideration. Small high current probes are important and cryogenic specimen holders are required for consistent suppression of contamination buildup on specimen areas of interest. Focussed probes useful for microanalysis should be in the range of 0.1 to 1nA, and estimates of spatial resolution to be expected for thin foil specimens can be made from the curves shown in Fig. 1.

Defect reduction in oxygen implanted silicon-on-insulator material during high-temperature annealing

1989 ◽  
Vol 47 ◽  
pp. 604-605
Author(s):  
P. Roitman ◽  
B. Cordts ◽  
S. Visitserngtrakul ◽  
S.J. Krause
Keyword(s):  
High Temperature ◽  
Annealing Temperature ◽  
Silicon On Insulator ◽  
High Dose ◽  
High Temperature Annealing ◽  
High Current ◽  
Defect Reduction ◽  
Annealing Step ◽  
Multiple Cycle ◽  
Defect Densities

Synthesis of a thin, buried dielectric layer to form a silicon-on-insulator (SOI) material by high dose oxygen implantation (SIMOX – Separation by IMplanted Oxygen) is becoming an important technology due to the advent of high current (200 mA) oxygen implanters. Recently, reductions in defect densities from 109 cm−2 down to 107 cm−2 or less have been reported. They were achieved with a final high temperature annealing step (1300°C – 1400°C) in conjunction with: a) high temperature implantation or; b) channeling implantation or; c) multiple cycle implantation. However, the processes and conditions for reduction and elimination of precipitates and defects during high temperature annealing are not well understood. In this work we have studied the effect of annealing temperature on defect and precipitate reduction for SIMOX samples which were processed first with high temperature, high current implantation followed by high temperature annealing.

CONDUCTIVITY MEASUREMENTS OF HIGH CURRENT, HIGH PRESSURE DISCHARGES

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-303-C7-304
Author(s):  
M. Skowronek ◽  
L. Giry ◽  
Vu Tien Gia ◽  
P. Romeas
Keyword(s):  
High Pressure ◽  
High Current ◽  
Conductivity Measurements

HIGH-CURRENT DIFFUSE DISCHARGE WITH THE EXPLOSIVE CATHODE PROCESS

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-281-C7-282
Author(s):  
A. P. Kchuzeev ◽  
Yu. D. Korolev ◽  
V. A. Kuzmin ◽  
G. A. Mesyats ◽  
V. P. Rotshtein ◽  
...  
Keyword(s):  
High Current ◽  
Diffuse Discharge ◽  
Cathode Process
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