Improved Infrared‐Response Technique for Determining Impurity and Defect Levels in Semiconductors

1972 ◽  
Vol 20 (3) ◽  
pp. 120-122 ◽  
Author(s):  
A. H. Sher ◽  
W. J. Keery
1982 ◽  
Vol 53 (9) ◽  
pp. 6391-6398 ◽  
Author(s):  
P. K. Bhattacharya ◽  
H.‐J. Bühlmann ◽  
M. Ilegems ◽  
J. L. Staehli

2020 ◽  
Vol 35 (22) ◽  
pp. 3041-3047
Author(s):  
Lingyan Xu ◽  
Yan Zhou ◽  
Xu Fu ◽  
Lu Liang ◽  
Wanqi Jie

Abstract


2008 ◽  
Vol 2008 ◽  
pp. 1-4
Author(s):  
Dmitry E. Milovzorov

The structural, optical, and conductivity properties of silicon film deposited on cerium dioxide buffer layer were studied. The electronic structure of system consists of various defect levels inside band gap. The temperature spatial distribution plays a great role in silicon crystallization. The field destruction of crystal phase and its restoration, after annealing, were investigated.


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