Modeling negative bias temperature instabilities in hole channel metal–oxide–semiconductor field effect transistors with ultrathin gate oxide layers
2006 ◽
Vol 45
(4B)
◽
pp. 3064-3069
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2002 ◽
Vol 41
(Part 1, No. 4B)
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pp. 2348-2352
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2014 ◽
Vol 43
(4)
◽
pp. 1207-1213
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2007 ◽
Vol 46
(4B)
◽
pp. 2011-2014
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2018 ◽
Vol 81
◽
pp. 1-6
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