Modeling negative bias temperature instabilities in hole channel metal–oxide–semiconductor field effect transistors with ultrathin gate oxide layers

2004 ◽  
Vol 95 (5) ◽  
pp. 2786-2791 ◽  
Author(s):  
M. Houssa ◽  
M. Aoulaiche ◽  
J. L. Autran ◽  
C. Parthasarathy ◽  
N. Revil ◽  
...  
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