In-situ nanostructured film formation during physical vapor deposition

Chi Zhang; Ramki Kalyanaraman

doi:10.1063/1.1632036

Elucidation of PVD MoS2 film formation process and its structure focusing on sub-monolayer region

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/ac3fc9 ◽

2021 ◽

Author(s):

Ryo Ono ◽

Shinya Imai ◽

Yuta Kusama ◽

Takuya Hamada ◽

Masaya Hamada ◽

...

Keyword(s):

Vapor Deposition ◽

Formation Process ◽

Physical Vapor Deposition ◽

Film Formation ◽

Dark Field ◽

Film Structure ◽

Internal Stresses ◽

Large Area ◽

Scanning Transmission ◽

Annular Dark Field

Abstract Sputtering enables uniform and clean deposition over a large area, which is an issue with exfoliation and chemi-cal vapor deposition methods. On the other hand, the process of physical vapor deposition (PVD) film formationhas not yet been clarified. We prepared several samples from the sub-monolayer region, and performed Ra-man spectroscopy, X-ray photon spectroscopy and high-angle annular dark-field scanning transmission electronmicroscopy. From these results, the internal stresses inherent to PVD films, the bonding states specific to sub-monolayers, and the unique film structure and the grain formation process of PVD films were discussed fromthe perspective of sub-monolayers. As a conclusion, we found that it is important to suppress the formation ofsub-monolayers on the substrate to completely form the first layer.

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A novel method for in-situ synthesized TiN coatings by plasma spray-physical vapor deposition

Materials Letters ◽

10.1016/j.matlet.2018.01.068 ◽

2018 ◽

Vol 217 ◽

pp. 127-130 ◽

Cited By ~ 17

Author(s):

Chen Song ◽

Min Liu ◽

Zi-Qian Deng ◽

Shao-Peng Niu ◽

Chun-Ming Deng ◽

...

Keyword(s):

Plasma Spray ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Tin Coatings ◽

Novel Method

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Growth and characterization of Ge nanostructures on Si(111)

MRS Proceedings ◽

10.1557/proc-696-n5.9 ◽

2001 ◽

Vol 696 ◽

Cited By ~ 1

Author(s):

F. Rosei ◽

N. Motta ◽

A. Sgarlata ◽

A. Balzarotti

Keyword(s):

Scanning Probe Microscopy ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Misfit Strain ◽

Contact Angles ◽

Scanning Probe ◽

Wetting Layer ◽

Reconstructed Surfaces

AbstractScanning Probe Microscopy (SPM) in situ is used to study the evolution of Ge islands grown by Physical Vapor Deposition on Si(111) 7×7 reconstructed surfaces. Large 3D islands form on the Wetting Layer (WL), with average lateral dimension in the range 200 - 500 nm. The statistical distribution of the island shapes has been analyzed, showing that three types of shapes coexist under certain conditions: strained, partially relaxed and ripened (atoll-like) islands. We measured the contact angles of the island facets, and observed the depletion of the substrate around the ripened islands. These features are attributed to the misfit strain, which is partially relieved by interdiffusion of Si into the Ge layers.

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Characterization of Palladium Acetylacetonate as a CVD Precursor for Pd Metallization

MRS Proceedings ◽

10.1557/proc-282-353 ◽

1992 ◽

Vol 282 ◽

Author(s):

Steven P. Kowalczyk ◽

Michael Ldgdlund ◽

Mats Fahlman ◽

William R. Salaneck

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Treatment ◽

Vapor Deposition ◽

Film Formation ◽

Chemical Vapor ◽

X Ray ◽

Palladium Acetylacetonate ◽

Metallic Palladium

ABSTRACTPalladium acetylacctonate has received much consideration as a possible precursor for chemical vapor deposition of metallic palladium films for a variety of microelectronic applications. We have studied the adsorption and decomposition of palladium acetylacetonate ongold, polyimide, silicon and silver surfaces to understand the initial mechanisms of metallic palladium film formation. In situ x-ray photoelcctron spectroscopy was used to characterized the films after adsorption and their decomposition after thermal treatment or laser irradiation.

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Microstructure and Coarsening in Mazed Bicrystal Films of Au Grown on Ge Substrates

MRS Proceedings ◽

10.1557/proc-648-p11.41 ◽

2000 ◽

Vol 648 ◽

Cited By ~ 2

Author(s):

Tamara Radetic ◽

Ulrich Dahmen

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition ◽

Morphological Analysis ◽

Grain Shape ◽

Strong Dependence ◽

Si Substrates ◽

Transmission Electron ◽

Grain Orientations ◽

Quantitative Morphological Analysis

AbstractThin films of gold (Au) were grown on single crystal germanium (Ge) or silicon (Si) substrates using physical vapor deposition (PVD). The resulting microstructure was that of a mazed bicrystal in which two equivalent grain orientations, related to each other by a 90° rotation, are arranged in a morphology of irregularly shaped, convoluted grains. Quantitative morphological analysis showed a strong dependence of grain shape on size, with larger grains being more convoluted and smaller grains more compact. The evolution of grain size, anisotropy and shape during heating in the temperature range from 300-340 °C was studied by in-situ transmission electron microscopy (TEM).

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Thermodynamic Constraints for the In Situ MOCVD Growth of Superconducting Tl-Ba-Ca-Cu-O Thin Films

MRS Proceedings ◽

10.1557/proc-335-165 ◽

1993 ◽

Vol 335 ◽

Author(s):

William L. Holstein

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Mocvd Growth ◽

Metal Organic ◽

Deposition Processes ◽

Organic Chemical Vapor Deposition

AbstractIn spite of several attempts, superconducting Tl-Ba-Ca-Cu-O thin films have not been successfully prepared in situ by metal organic chemical vapor deposition (MOCVD). Preparation of a phase by MOCVD requires that it be thermodynamically stable with respect to its decomposition into volatile species and other condensed phases. For MOCVD growth of Tl-Ba- Ca-Cu-O compounds in the presence of oxygen from reagents containing only C-H or C-H-O ligands, Tl2O(g) and TIOH(g) exhibit appreciable volatility. If reagents with ligands containing fluorine are used, the formation of volatile TIF(g) must also be considered. Thermodynamic data for these materials are compiled, and thermodynamic relationships between these gases, H2O(g) and HF(g) are established. The thermodynamic stability of TIOH(g) and TIF(g) makes the in situ growth of Tl-Ba-Ca-Cu-O compounds by MOCVD more difficult than their in situ growth by physical vapor deposition processes, for which Tl2O(g) is the only volatile TI-containing species present.

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Growing CdS flag from a wire through in situ controlling the catalyst

CrystEngComm ◽

10.1039/d1ce00289a ◽

2021 ◽

Author(s):

Beibei Dai ◽

Chao Fan ◽

Xing Xu ◽

Zhuodong Qi ◽

Qin Xiao ◽

...

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition

Flag-like CdS microstructures was achieved via a physical vapor deposition (PVD) route. A CdS flag was grown from a wire through in situ changing the position of Pb catalyst from...

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Comparison of Electron-Beam Physical Vapor Deposition and Plasma-Spray Physical Vapor Deposition Thermal Barrier Coating Properties Using Synchrotron X-Ray Diffraction

Volume 6: Ceramics; Controls, Diagnostics, and Instrumentation; Education; Manufacturing Materials and Metallurgy ◽

10.1115/gt2019-90828 ◽

2019 ◽

Cited By ~ 1

Author(s):

Matthew Northam ◽

Lin Rossmann ◽

Brooke Sarley ◽

Bryan Harder ◽

Jun-Sang Park ◽

...

Keyword(s):

Electron Beam ◽

High Temperature ◽

Plasma Spray ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Thermal Barrier ◽

Jet Engines ◽

X Ray Diffraction ◽

X Ray

Abstract Electron-beam physical vapor deposition (EB-PVD) is widely used for the application of thermal barrier coatings (TBCs) to turbine blades in jet engines. An emerging method, plasma-spray physical vapor deposition (PS-PVD), is a hybrid technique whereby coatings can be applied via the liquid phase to form lamellar microstructures or via the vapor to form columnar microstructures similar to that of EB-PVD. In this study, PS-PVD and conventional EB-PVD coated samples of a columnar configuration were prepared and thermally cycled to 300 and 600 cycles. These samples were subsequently characterized in-situ, under thermal load using synchrotron x-rays. From the high-resolution x-ray diffraction (XRD) patterns, the residual and in-situ strain in the TGO layer was obtained during a thermal cycle. At high temperature, the TGO layer for both deposition methods displayed a constant near zero-strain for all samples as anticipated. In the samples with 300 thermal cycles, both deposition methods showed similar strain profiles in the TGO layer. For samples with 600 cycles, PS-PVD samples showed a more significant strain relief in the TGO at room temperature compared to similarly cycled EB-PVD samples. This could explain the coating lifetime performance between the two deposition methods. The findings support ongoing efforts to tune the manufacturing of PS-PVD coatings towards the goal of meeting or exceeding the performance of currently used coatings on jet engines. This will pave the way for more affordable high temperature coating alternatives that meet durability needs.

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Selective self-assembly of semi-metal straight and branched nanorods on inert substrates

10.1093/oxfordhb/9780199533053.013.15 ◽

2017 ◽

Author(s):

X.-S. Wang ◽

S.S. Kushvaha ◽

X. Chu ◽

H. Zhang ◽

Z. Yan ◽

...

Keyword(s):

Surface Morphology ◽

Vapor Deposition ◽

Self Assembly ◽

Physical Vapor Deposition ◽

The Self ◽

Scanning Tunnelling Microscope ◽

Drift Correction ◽

Atomic Structures ◽

Scanning Tunnelling

This article discusses the selective self-assembly of semi-metal straight and branched nanorods on inert substrates. In particular, it describes antimony (Sb) nanorods and bismuth (Bi) nanobelts on inert substrates by physical vapor deposition in vacuum without using any catalyst and nanoscale template. After describing the experimental and drift correction procedures, the article reviews previous studies of semi-metal growth on inert substrates. It then measures the surface morphology and atomic structures of self-assembled Sb nanorods and Bi nanobelts using an in-situ scanning tunnelling microscope (STM) in ultrahigh vacuum (UHV). Based on these STM data, a mechanism for the self-assembly of straight and branched semi-metal nanorods is proposed.

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