In-Situ Optical Wafer Temperature Measurement

2003 ◽  
Author(s):  
Bruce Adams
Keyword(s):  
Temperature Measurement ◽  
Wafer Temperature

scholarly journals In-situ wafer temperature measurement during firing process via inline infrared thermography

2019 ◽  
Author(s):  
Daniel Ourinson ◽  
Gernot Emanuel ◽  
Attila Csordás ◽  
Gunnar Dammaß ◽  
Harald Müller ◽  
...  
Keyword(s):  
Temperature Measurement ◽  
Infrared Thermography ◽  
Firing Process ◽  
Wafer Temperature

scholarly journals In Situ Solar Wafer Temperature Measurement during Firing Process via Inline IR Thermography

2019 ◽  
Vol 13 (10) ◽  
pp. 1900270 ◽  
Author(s):  
Daniel Ourinson ◽  
Gernot Emanuel ◽  
Attila Csordás ◽  
Gunnar Dammaß ◽  
Harald Müller ◽  
...  
Keyword(s):  
Temperature Measurement ◽  
Firing Process ◽  
Ir Thermography ◽  
Wafer Temperature

scholarly journals Correlation Between Insulation Resistance and Temperature Measurement Error in Type K and Type N Mineral Insulated, Metal Sheathed Thermocouples

2022 ◽  
Vol 43 (3) ◽  
Author(s):  
Jonathan Pearce ◽  
Declan Tucker ◽  
Carmen García Izquierdo ◽  
Raul Caballero ◽  
Trevor Ford ◽  
...  
Keyword(s):  
Temperature Measurement ◽  
Measurement Errors ◽  
Insulation Resistance ◽  
Monitoring And Control ◽  
Type K ◽  
Reference Type ◽  
Process Monitoring And Control ◽  
Resistance Breakdown ◽  
And Control

AbstractMineral insulated, metal sheathed (MI) Type K and Type N thermocouples are widely used in industry for process monitoring and control. One factor that limits their accuracy is the dramatic decrease in the insulation resistance at temperatures above about 600 °C which results in temperature measurement errors due to electrical shunting. In this work the insulation resistance of a cohort of representative MI thermocouples was characterised at temperatures up to 1160 °C, with simultaneous measurements of the error in indicated temperature by in situ comparison with a reference Type R thermocouple. Intriguingly, there appears to be a systematic relationship between the insulation resistance and the error in the indicated temperature. At a given temperature, as the insulation resistance decreases, there is a corresponding increasingly negative error in the temperature measurement. Although the measurements have a relatively large uncertainty (up to about 1 °C in temperature error and up to about 10 % in insulation resistance measurement), the trend is apparent at all temperatures above 600 °C, which suggests that it is real. Furthermore, the correlation disappears at temperatures below about 600 °C, which is consistent with the well-established diminution of insulation resistance breakdown effects below that temperature. This raises the intriguing possibility of using the as-new MI thermocouple calibration as an indicator of insulation resistance breakdown: large deviations of the electromotive force (emf) in the negative direction could indicate a correspondingly low insulation resistance.

scholarly journals In-Situ Local Temperature Measurement During Three-Dimensional Direct Laser Writing

CLEO: 2013 ◽  
2013 ◽  
Author(s):  
Jonathan Mueller ◽  
Joachim Fischer ◽  
Yatin Jadavji Mange ◽  
Thomas Nann ◽  
Martin Wegener
Keyword(s):  
Temperature Measurement ◽  
Three Dimensional ◽  
Local Temperature ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Direct Laser

In Situ Temperature Measurement in the Shearing Zone during Sheet Metal Blanking

2012 ◽  
Vol 445 ◽  
pp. 207-212
Author(s):  
Peter Demmel ◽  
Martin Hirsch ◽  
Roland Golle ◽  
Hartmut Hoffmann
Keyword(s):  
Temperature Measurement ◽  
Sheet Metal
Sign in / Sign up

Export Citation Format

Share Document