scholarly journals Submillimeter-Wavelength Plasma Diagnostics For Semiconductor Manufacturing

2003 ◽  
Author(s):  
Eric C. Benck
1997 ◽  
Vol 51 (10) ◽  
pp. 96-102
Author(s):  
Yu. Ye. Kamenev ◽  
V. K. Kiseliov ◽  
Ye. M. Kuleshov ◽  
B. N. Knyaz'kov ◽  
V. K. Kononenko ◽  
...  

Author(s):  
Eric C. Benck ◽  
Guerman Yu. Golubiatnikov ◽  
Gerald T. Fraser ◽  
Bing Ji ◽  
Stephen A. Motika ◽  
...  

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-871-C7-872
Author(s):  
E. F. Gippius ◽  
B. I. Iljukhin ◽  
V. N. Kolesnikov

Author(s):  
Anqi Qiu ◽  
William Lowe ◽  
Mridul Arora

Abstract Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.


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