Hydrosilylation of crystalline silicon (111) and hydrogenated amorphous silicon surfaces: A comparative x-ray photoelectron spectroscopy study

2003 ◽  
Vol 94 (4) ◽  
pp. 2289-2294 ◽  
Author(s):  
A. Lehner ◽  
G. Steinhoff ◽  
M. S. Brandt ◽  
M. Eickhoff ◽  
M. Stutzmann
Keyword(s):  
Amorphous Silicon ◽  
Photoelectron Spectroscopy ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Surfaces ◽  
Spectroscopy Study ◽  
X Ray ◽  
Hydrogenated Amorphous

Photo-Oxidation of Hydrogenated Amorphous Silicon-Carbon Alloys

1989 ◽  
Vol 158 ◽  
Author(s):  
P. John ◽  
I.M. Odeh ◽  
A. Qayyum ◽  
J.I.B. Wilson
Keyword(s):  
Amorphous Silicon ◽  
Photoelectron Spectroscopy ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Discharge ◽  
Silicon Substrates ◽  
Capacitively Coupled ◽  
X Ray ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon-carbon alloys, a-Si:C:H, have been deposited as thin films (d=0.1-0.5 micron) on crystalline silicon substrates from a capacitively coupled rf discharge in silane-propane mixtures. Variations in the stoichiometry of the films were achieved by altering the ratio of SiH4 to C3H8 flow rates at a sbstrate temperature in the range 240-260°C and total pressure between 30-70 mtorr. The silicon to carbon ratios were established by X-ray photoelectron spectroscopy, XPS, and the hydrogen content and distribution by infra-red spectroscopy.

Hydrogenated Amorphous Silicon/Crystalline Silicon Double Heterojunction X-Ray Sensor

1996 ◽  
Vol 35 (Part 1, No. 10) ◽  
pp. 5342-5345
Author(s):  
Guang-pu Wei ◽  
Wen-biao Wu ◽  
Takashi Kita ◽  
Hiroshi Nakayama ◽  
Taneo Nishino ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
X Ray ◽  
Double Heterojunction ◽  
Hydrogenated Amorphous
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