Substrate effect on the crystal structure and ferroelectricity of low-temperature-deposited Pb(Zr, Ti)O3 thin films by metalorganic chemical vapor deposition

Kouji Tokita; Masanori Aratani; Hiroshi Funakubo

doi:10.1063/1.1581975

Substrate effect on the crystal structure and ferroelectricity of low-temperature-deposited Pb(Zr, Ti)O3 thin films by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1581975 ◽

2003 ◽

Vol 82 (23) ◽

pp. 4122-4124 ◽

Cited By ~ 13

Author(s):

Kouji Tokita ◽

Masanori Aratani ◽

Hiroshi Funakubo

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Substrate Effect ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor deposition

Materials Research Bulletin ◽

10.1016/0025-5408(89)90128-1 ◽

1989 ◽

Vol 24 (2) ◽

pp. 213-219 ◽

Cited By ~ 15

Author(s):

Angus B. Laurie ◽

Michael L. Norton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Normal Pressure ◽

Metalorganic Chemical

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Low temperature deposition of Ba1-xSrxTiO3 thin films by ECR plasma-enhanced metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808202076 ◽

1998 ◽

Vol 21 (1-4) ◽

pp. 355-366 ◽

Cited By ~ 3

Author(s):

S. R. Gilbert ◽

S. R. Summerfelt ◽

T. S. Moise ◽

J. M. Anthony

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Ecr Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Metalorganic Chemical

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Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582390 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1590-1594 ◽

Cited By ~ 4

Author(s):

Jin-Hyo Boo ◽

Cheol Ho Heo ◽

Yong Ki Cho ◽

Jeon-Geon Han

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Temperature Growth ◽

Low Temperature Growth ◽

D2 Steel ◽

Metalorganic Chemical

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Direct Preparation of Crystalline SrBi2(Ta1-xNbx)2O9 Thin Films by Thermal Metalorganic Chemical Vapor Deposition at Low Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.l822 ◽

2000 ◽

Vol 39 (Part 2, No. 8A) ◽

pp. L822-L824 ◽

Cited By ~ 8

Author(s):

Masatoshi Mitsuya ◽

Norimasa Nukaga ◽

Hiroshi Funakubo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Direct Preparation ◽

Metalorganic Chemical

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Metalorganic Chemical Vapor Deposition of Epitaxial SrBi2Ta2O9 Thin Films and Their Crystal Structure

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.l258 ◽

1999 ◽

Vol 38 (Part 2, No. 3A) ◽

pp. L258-L260 ◽

Cited By ~ 9

Author(s):

Katsuyuki Ishikawa ◽

Norimasa Nukaga ◽

Hiroshi Funakubo

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Thin films of CoAs from low‐temperature metalorganic chemical vapor deposition of a novel single‐source precursor compound

Applied Physics Letters ◽

10.1063/1.115455 ◽

1995 ◽

Vol 67 (6) ◽

pp. 822-824 ◽

Cited By ~ 15

Author(s):

Franz‐Robert Klingan ◽

Alexander Miehr ◽

Roland A. Fischer ◽

Wolfgang A. Herrmann

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Low temperature growth of oxide thin films by metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808238765 ◽

1998 ◽

Vol 20 (1-4) ◽

pp. 55-64 ◽

Cited By ~ 1

Author(s):

S. S. Yom

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Temperature Growth ◽

Low Temperature Growth ◽

Metalorganic Chemical

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Property Improvement of 75 nm-thick Directly-crystallized SrBi2Ta2O9 Thin Films by Pulse-introduced Metalorganic Chemical Vapor Deposition at Low Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.l758 ◽

2001 ◽

Vol 40 (Part 2, No. 7B) ◽

pp. L758-L760 ◽

Cited By ~ 1

Author(s):

Masatoshi Mitsuya ◽

Norimasa Nukaga ◽

Takayuki Watanabe ◽

Hiroshi Funakubo ◽

Keisuke Saito

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation of SrBi2Ta2O9 Thin Films Consisting of Uniform Grains at Low Temperature by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.l710 ◽

2002 ◽

Vol 41 (Part 2, No. 6B) ◽

pp. L710-L712 ◽

Cited By ~ 3

Author(s):

Norimasa Nukaga ◽

Mami Saito ◽

Kumi Okuwada ◽

Hiroshi Funakubo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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