Dielectric properties of Pr2O3 high-k films grown by metalorganic chemical vapor deposition on silicon

2003 ◽  
Vol 83 (1) ◽  
pp. 129-131 ◽  
Author(s):  
Raffaella Lo Nigro ◽  
Vito Raineri ◽  
Corrado Bongiorno ◽  
Roberta Toro ◽  
Graziella Malandrino ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Dielectric Properties ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
High K ◽  
Metalorganic Chemical

Ferroelectric Properties of a-Axis Textured BaTiO3 Thin Films

1993 ◽  
Vol 310 ◽  
Author(s):  
H. A. Lu ◽  
L. A. Wills ◽  
B. W. Wessels ◽  
X. Zhan ◽  
J. A. Helfrich ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Dielectric Properties ◽  
Electric Field ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Ferroelectric Properties ◽  
Chemical Vapor ◽  
Ferroelectric Hysteresis ◽  
Metalorganic Chemical

AbstractFerroelectric and dielectric properties were measured for BaTiO3 thin films prepared by metalorganic chemical vapor deposition which were highly a-axis textured. No ferroelectric hysteresis was observed from the as-deposited BaTiO3 films on Pt coated MgO. Upon applying an electric field exceeding a threshold electric field, Et, ∼ 50 - 100 kV/cm, a ferroelectric hysteresis was observed. A spontaneous polarization Ps ≥ 15 μC/cm2 was measured for the textured films.

scholarly journals Metalorganic chemical vapor deposition of InN quantum dots and nanostructures

2021 ◽  
Vol 10 (1) ◽  
Author(s):  
Caroline E. Reilly ◽  
Stacia Keller ◽  
Shuji Nakamura ◽  
Steven P. DenBaars
Keyword(s):  
Quantum Dots ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Near Infrared ◽  
Optoelectronic Devices ◽  
Chemical Vapor ◽  
Electromagnetic Spectrum ◽  
Material System ◽  
Metalorganic Chemical

AbstractUsing one material system from the near infrared into the ultraviolet is an attractive goal, and may be achieved with (In,Al,Ga)N. This III-N material system, famous for enabling blue and white solid-state lighting, has been pushing towards longer wavelengths in more recent years. With a bandgap of about 0.7 eV, InN can emit light in the near infrared, potentially overlapping with the part of the electromagnetic spectrum currently dominated by III-As and III-P technology. As has been the case in these other III–V material systems, nanostructures such as quantum dots and quantum dashes provide additional benefits towards optoelectronic devices. In the case of InN, these nanostructures have been in the development stage for some time, with more recent developments allowing for InN quantum dots and dashes to be incorporated into larger device structures. This review will detail the current state of metalorganic chemical vapor deposition of InN nanostructures, focusing on how precursor choices, crystallographic orientation, and other growth parameters affect the deposition. The optical properties of InN nanostructures will also be assessed, with an eye towards the fabrication of optoelectronic devices such as light-emitting diodes, laser diodes, and photodetectors.

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