Nanostructuring of silicon by electron-beam lithography of self-assembled hydroxybiphenyl monolayers

2003 ◽  
Vol 82 (21) ◽  
pp. 3776-3778 ◽  
Author(s):  
A. Küller ◽  
W. Eck ◽  
V. Stadler ◽  
W. Geyer ◽  
A. Gölzhäuser
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Self Assembled

Low voltage electron beam lithography in self‐assembled ultrathin films with the scanning tunneling microscope

1994 ◽  
Vol 64 (3) ◽  
pp. 390-392 ◽  
Author(s):  
C. R. K. Marrian ◽  
F. K. Perkins ◽  
S. L. Brandow ◽  
T. S. Koloski ◽  
E. A. Dobisz ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ultrathin Films ◽  
Electron Beam Lithography ◽  
Scanning Tunneling Microscope ◽  
Low Voltage ◽  
Scanning Tunneling ◽  
Tunneling Microscope ◽  
Voltage Electron ◽  
Self Assembled

Production of Nanopatterns by a Combination of Electron Beam Lithography and a Self-Assembled Monolayer for an Antibody Nanoarray

2007 ◽  
Vol 7 (2) ◽  
pp. 410-417 ◽  
Author(s):  
Guo-Jun Zhang ◽  
Takashi Tanii ◽  
Yuzo Kanari ◽  
Iwao Ohdomari
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Specificity ◽  
Nonspecific Binding ◽  
Self Assembled Monolayer ◽  
Incubation Condition ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled

We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-IgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.

Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers

Small ◽  
2005 ◽  
Vol 1 (8-9) ◽  
pp. 833-837 ◽  
Author(s):  
Guo-Jun Zhang ◽  
Takashi Tanii ◽  
Tamotsu Zako ◽  
Takumi Hosaka ◽  
Takeo Miyake ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Self Assembled Monolayers ◽  
Nanoscale Patterning ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Structuring of self-assembled three-dimensional photonic crystals by direct electron-beam lithography

2003 ◽  
Vol 83 (25) ◽  
pp. 5289-5291 ◽  
Author(s):  
P. Ferrand ◽  
M. Egen ◽  
R. Zentel ◽  
J. Seekamp ◽  
S. G. Romanov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Self Assembled
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