scholarly journals Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition

2003 ◽  
Vol 93 (11) ◽  
pp. 8930-8938 ◽  
Author(s):  
A. del Prado ◽  
E. San Andrés ◽  
I. Mártil ◽  
G. González-Diaz ◽  
D. Bravo ◽  
...  
2001 ◽  
Vol 10 (3-7) ◽  
pp. 1264-1267 ◽  
Author(s):  
F Giorgis ◽  
A Chiodoni ◽  
G Cicero ◽  
S Ferrero ◽  
P Mandracci ◽  
...  

2000 ◽  
Vol 640 ◽  
Author(s):  
F. Giorgis ◽  
A. Chiodoni ◽  
G. Cicero ◽  
S. Ferrero ◽  
P. Mandracci ◽  
...  

ABSTRACTIn this work we mainly report on the analyses of polycrystalline silicon carbide films grown by Electron Cyclotron Resonance Chemical Vapor Deposition (ECR-CVD) on Si (100) and Si (111) substrates. Structural properties of the films have been analyzed by X-ray diffractometry, transmission electron microscopy and micro-Raman spectroscopy. Samples deposited with optimized deposition conditions, show a polycrystalline columnar structure with lateral crystal dimensions ranging from 300 up to 1400 Å and an orientation close to that of the Si substrates.


1994 ◽  
Vol 30 (1) ◽  
pp. 84-85 ◽  
Author(s):  
R.J. Shul ◽  
D.J. Rieger ◽  
C. Constantine ◽  
A.G. Baca ◽  
C. Barratt

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